Mask Synthesis Consistency for Integrated Circuit Chips
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Solution Overview
Problem
As chip dimensions decrease, the number of noise factors in circuit design increases, leading to inconsistent and asymmetric mask synthesis solutions, which are costly and error-prone in the chip fabrication process.
Innovation Solution
A system that generates masks for circuit designs by identifying unique circuit patterns, building a mask solutions database, and enforcing consistency and symmetry across random areas of the circuit design, ensuring identical masks for identical circuit patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If separate masks are used for different circuit patterns, then manufacturing flexibility is improved, but manufacturing cost increases
Solution Approach 1:
The patent creates a universal mask solution by identifying identical circuit patterns across different locations and applying the same mask pattern to all of them. The mask synthesis system generates a single mask pattern for each unique circuit pattern type, which is then reused multiple times across the chip layout. This eliminates the need for separate masks for each pattern instance, reducing manufacturing cost while maintaining the ability to handle different circuit designs through the pattern-matching approach.
2Manufacturing precision
If separate masks are generated for different circuit patterns, then pattern-specific optimization is improved, but manufacturing precision deteriorates
Solution Approach 1:
The system ensures mask consistency by generating a single universal mask pattern for each unique circuit pattern type. The pattern identification and matching process guarantees that identical circuit patterns receive identical mask patterns, eliminating asymmetry and inconsistency. This universal approach maintains pattern-specific optimization because each unique pattern is still optimized individually, but the consistency across all instances of the same pattern type ensures reliable manufacturing.
3Measurement precision
If mask synthesis is performed for each circuit pattern separately, then computational accuracy is improved, but processing time increases
Solution Approach 1:
The patent implements a preliminary action by first identifying and cataloging all unique circuit patterns in the layout before generating mask patterns. The system traverses the layout, extracts unique patterns, and stores them in a database. This preliminary identification step allows the subsequent mask generation to reuse previously computed patterns, avoiding redundant computations. The signature-based indexing system enables quick lookup of existing patterns, significantly reducing processing time while maintaining computational accuracy for each unique pattern.
Solution Approach 2:
The system creates copies of mask patterns for identical circuit patterns by using signature-based matching. Once a mask pattern is generated for a unique circuit pattern, the system copies this pattern to all locations in the layout where the same circuit pattern occurs. This copying approach eliminates the need to recompute mask patterns for identical patterns, drastically reducing processing time while ensuring consistency and maintaining the computational accuracy achieved during the initial pattern generation.
Data Source
AI summary
A system generates a mask for a circuit design while enforcing symmetry and consistency across random areas of the mask. The system builds a mask solutions database mapping circuit patterns to mask patterns. The system uses the mask solutions database to replace circuit patterns of the circuit design with mask patterns. The system identifies properties in circuit patterns of the circuit design and enforces the same property in the corresponding mask patterns. Examples of properties enforced include symmetry within circuit patterns and similarity across circuit patterns. The system combines mask patterns in different regions of the circuit and resolves conflicts that occur when there are multiple masks within a region.