Mask Synthesis Engine Dose Information Generation
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Solution Overview
Problem
In lithography manufacturing systems, the separation between mask synthesis engines and mask writing devices leads to errors in dose information generation, affecting the fabrication of integrated circuit chips due to the lack of access to IC chip designs within the mask writing tool.
Innovation Solution
Generating dose information within the mask synthesis engine, which also produces mask vector files, allows for tighter coupling and reduced errors by monitoring wafer errors and using the mask error enhancement factor to correct for errors introduced during the mask writing process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If dose information is generated by the mask writing device, then the mask writing device can independently control the exposure process, but errors occur due to lack of access to IC chip design information
Solution Approach 1:
The patent merges the dose information generation function into the mask synthesis engine, which has access to complete IC chip design information. This integration allows the mask synthesis engine to generate accurate dose information that accounts for design-specific factors, while the mask writing device executes the combined mask pattern and dose data, achieving both accuracy and operational control.
Solution Approach 2:
The patent introduces a file format intermediary that carries dose information from the mask synthesis engine to the mask writing device. This intermediary structure enables the transfer of design-critical dose data while maintaining the functional separation between synthesis and writing operations, resolving the contradiction between independent control and information access.
2Adaptability or versatility
If the mask synthesis engine and mask writing device are separated, then each device can be optimized independently, but errors are introduced due to lack of design access in the writing tool
Solution Approach 1:
The patent applies preliminary action by having the mask synthesis engine pre-calculate and embed dose information into the mask data before transmission to the mask writing device. This advance preparation ensures that all design-critical parameters are accounted for before the writing process begins, maintaining reliability while allowing independent device optimization.
Solution Approach 2:
The extended file format acts as an intermediary that bridges the separated synthesis and writing devices. It carries both mask pattern data and associated dose information, ensuring that the writing device receives complete fabrication instructions without needing direct access to the design tool, thus maintaining reliability through information completeness.
3Productivity
If dose information is generated without access to IC chip design, then the process is simpler and faster, but wafer errors increase affecting fabrication yield
Solution Approach 1:
The patent combines dose information generation with mask pattern creation in the mask synthesis engine. This merging allows both operations to occur simultaneously during the design phase, maintaining fast processing speeds while ensuring dose accuracy reflects the actual IC chip design geometry and requirements.
Data Source
AI summary
A method comprises receiving an integrated circuit (IC) design file and determining, by one or more processors, dose information from the IC design file. The method further comprises determining, by the one or more processors, a mask vector file from the IC design file, and converting, by the one or more processors, the dose information to a vector file format. Further, the method comprises outputting the dose information in the vector file format and the mask vector file to a mask writer device.