Mask with Variable Opening Sizes for Uniform Photo-Aligning Layer Illumination
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Solution Overview
Problem
As liquid crystal panels increase in size, achieving uniform alignment of the photo-aligning layer becomes challenging due to the larger light irradiated surface, leading to issues with light divergence and non-uniform illumination.
Innovation Solution
A light irradiation apparatus and method that uses a mask with adjustable openings to guide light to the photo-aligning layer, where the size of the openings is adjusted based on the distance between the mask and the layer to maintain light straightness and minimize divergence, ensuring precise alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the light irradiated surface is increased to accommodate larger liquid crystal panels, then the coverage area is improved, but the light divergence increases and uniformity deteriorates
Solution Approach 1:
The mask is divided into multiple segments corresponding to different distance zones from the light source. Each segment has openings of appropriate size for its specific distance range, allowing the large irradiated surface to be covered while maintaining uniform alignment precision across the entire area.
Solution Approach 2:
Different regions of the mask have different opening sizes tailored to their specific distances from the light source. Closer regions have smaller openings while farther regions have larger openings, ensuring that each local area receives optimal light control for uniform alignment.
2Area of stationary object
If the opening size in the mask is increased to cover larger areas, then the illumination coverage is improved, but the light divergence increases and straightness deteriorates
Solution Approach 1:
The mask opening structure is segmented into multiple zones with different opening sizes. Each zone is optimized for its specific distance from the light source, allowing large overall coverage while maintaining light straightness in each local zone through appropriately sized openings.
Solution Approach 2:
The solution transitions from a single uniform opening size to a two-dimensional gradient of opening sizes across the mask surface. This dimensional change allows the system to simultaneously achieve large coverage area and maintain light straightness by adjusting opening size as a function of distance from the light source.
3Device complexity
If a fixed mask design is used, then the device complexity is reduced, but the adaptability to different distances and sizes deteriorates
Solution Approach 1:
The mask transitions from a static fixed design to a dynamic multi-zone structure where different regions automatically adapt to different distances from the light source. The varying opening sizes across zones provide distance adaptability while maintaining a single integrated mask structure.
Solution Approach 2:
The mask design incorporates gradual parameter changes in opening sizes across different zones rather than abrupt changes. This allows the mask to adapt to varying distances and coverage requirements while maintaining manufacturing feasibility and structural simplicity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for efficient and uniform alignment of large-area photo-aligning layers with minimized non-aligned portions, enhancing the performance of optical filters and stereoscopic image display devices by maintaining high illumination levels and reducing crosstalk.
Implementation Method 1
irradiating light toward a mask including at least one opening to guide the light to the photo-aligning layer
Implementation Method 2
A size of the opening may be adjusted according to a distance between the mask and the photo-aligning layer
Data Source
AI summary
A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.