Masked Optical Fiber for High-Resolution Patterning
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Solution Overview
Problem
Current methods for shaping the cleaved end of optical fibers are costly due to the lack of versatile fabrication procedures for batch manufacturing of micromachined parts, and standard photolithography processes are cumbersome for precise alignment.
Innovation Solution
The align-and-shine photolithography technique combines standard optical lithography with opto-mechanical methods for automatic alignment, using a masked optical fiber to project patterns onto a photoresist layer, enabling fast and convenient fabrication of arbitrary patterns with high resolution on optical fibers and other surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If standard photolithography is used for patterning optical fibers, then pattern fabrication capability is achieved, but alignment complexity and operation difficulty increase significantly
Solution Approach 1:
The optical fiber itself serves as the alignment reference by utilizing its own core structure. The cladding mode resonance features act as self-generated alignment markers that automatically guide the photolithography mask positioning, eliminating the need for external alignment tools or complex positioning procedures.
Solution Approach 2:
Cladding mode resonance features serve as an intermediary alignment mechanism between the optical fiber and the photolithography mask. These resonance features provide visible optical signals that mediate the alignment process, making it straightforward to position the mask correctly without complex mechanical alignment systems.
2Adaptability or versatility
If micromachining processes are used for shaping optical fiber ends, then functional patterns can be created, but production costs increase due to lack of batch manufacturing capability
Solution Approach 1:
The patent replaces mechanical micromachining processes with optical photolithography methods. By using light-based patterning through the optical fiber core, complex functional patterns can be created without mechanical contact or complex micromachining equipment, enabling more cost-effective batch production.
Solution Approach 2:
The photolithography approach provides universal patterning capability that can create various functional patterns (lenses, gratings, antennas, etc.) using a single method. This multi-functional approach eliminates the need for different specialized micromachining processes for different pattern types, reducing overall production complexity and cost.
3Manufacturing precision
If precise alignment tools are used for photolithography on optical fibers, then patterning accuracy is improved, but device complexity and operation time increase
Solution Approach 1:
The optical fiber's own optical properties (cladding mode resonance) provide the alignment reference, eliminating the need for external precision alignment tools. The fiber itself generates the alignment signals through its resonance features, achieving high positioning accuracy without complex alignment equipment.
4Manufacturing precision
If conventional photolithography alignment methods are used, then mask positioning can be achieved, but production speed decreases due to cumbersome alignment procedures
Solution Approach 1:
The method enables rapid self-alignment by utilizing the optical fiber's intrinsic cladding mode resonance features as alignment markers. This self-service approach eliminates time-consuming manual or mechanical alignment procedures, allowing fast mask positioning while maintaining precise patterning accuracy.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for rapid and cost-effective production of optical fibers with functional patterns and structures, such as nanoantennae, Fresnel lenses, and wavelength gratings, facilitating the construction of complex three-dimensional structures for various applications, including biochemical sensing and atomic force microscopy.
Implementation Method 1
an optical mask adapted for projecting a predetermined pattern on a target surface by radiation transmitted from the distal end of the optical fiber
Implementation Method 2
a photoresist layer deposited on the target surface, in particular the distal end of a target optical fiber
Data Source
AI summary
The invention provides an optical fiber, a method for the preparation thereof, and a device. An optical fiber, wherein a distal end of the optical fiber is provided with an optical mask adapted for projecting a predetermined pattern on a target surface by radiation transmitted from the distal end of the optical fiber, allows for the rapid application of patterns and three-dimensional structures on target surfaces, in particular on the ends of optical fibers.