Maskless Exposure Device DMD Alignment Control
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Solution Overview
Problem
The existing maskless exposure devices for display substrates face challenges in forming uniform metal patterns due to non-uniform beam characteristics, leading to defects such as display panel stains, which increase manufacturing costs and require multiple masks for different patterns.
Innovation Solution
A maskless exposure device equipped with a digital micro-mirror device and a system control part that uses graphic data system files to control the exposure process, including X-align-keys and Y-align-keys to correct misalignments and ensure precise pattern formation without masks, thereby reducing defects and manufacturing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If maskless exposure device is used to eliminate masks, then manufacturing cost is reduced and flexibility is improved, but wiring uniformity deteriorates and defects increase due to beam variations
Solution Approach 1:
The patent applies parameter changes by dynamically adjusting beam parameters (size, position, intensity) through a digital micro-mirror device (DMD) and control system. The DMD modifies the optical path of each beam independently, allowing real-time compensation for variations in beam characteristics to achieve uniform wiring patterns without masks.
Solution Approach 2:
The patent implements feedback control by measuring actual beam parameters and using this information to adjust subsequent beam irradiation. The control system monitors beam position, size, and intensity variations, and automatically compensates by modifying DMD mirror angles or exposure parameters to maintain wiring uniformity.
2Manufacturing precision
If multiple masks are used for different metal patterns, then pattern precision is maintained, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent applies universality by making the single exposure device capable of forming multiple different metal patterns through software control of the DMD. The system can switch between different patterns (data lines, gate lines, etc.) by loading different graphic data system files, eliminating the need for multiple physical masks while maintaining pattern precision.
Solution Approach 2:
The patent uses digital copying by representing metal patterns as graphic data system files that can be stored and reproduced. Instead of physical masks, the pattern information is copied digitally and used to control DMD mirror configurations, allowing unlimited pattern variations without additional hardware complexity.
3Adaptability or versatility
If beams are independently controlled for maskless exposure, then flexibility and adaptability are improved, but alignment precision deteriorates due to varying beam positions and sizes
Solution Approach 1:
The patent applies parameter changes by dynamically adjusting individual beam parameters (position, size, intensity) through DMD mirror angle control. The system modifies beam characteristics in real-time based on the required pattern geometry, allowing flexible adaptation to different wiring layouts while maintaining alignment precision through active compensation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution effectively decreases defects on display panels by improving alignment and pattern uniformity, reducing the need for multiple masks and lowering manufacturing costs through precise control of the exposure process.
Implementation Method 1
a digital micro-mirror device, the digital micro-mirror device being configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate
Implementation Method 2
light is irradiated upon an upper surface of the mask so that the photoresist layer is exposed and developed
Data Source
AI summary
A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.