Maskless Exposure Device Digital Micro-Mirror Control
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Solution Overview
Problem
The existing mask-based exposure methods for forming metal patterns on display substrates are costly and prone to defects due to the need for multiple masks and inconsistent light beam characteristics in maskless exposure devices, leading to non-uniform wiring and potential stains on display panels.
Innovation Solution
A maskless exposure device equipped with a digital micro-mirror device and a system control part that uses graphic data system files to control the exposure process, allowing for precise control of light beams to form desired patterns on the substrate, including source electrodes, drain electrodes, and channel portions extending diagonally to ensure uniform exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If maskless exposure device is used to reduce manufacturing cost, then manufacturing cost is reduced, but wiring uniformity deteriorates due to inconsistent light beam characteristics
Solution Approach 1:
The patent uses a digital micro-mirror device (DMD) to create optical copies of pattern data from a graphic data system file. Instead of using physical masks, the system digitally reproduces the desired metal patterns by selectively reflecting light beams according to the stored pattern information, thereby eliminating mask fabrication costs while maintaining pattern precision through digital control
Solution Approach 2:
The system dynamically adjusts beam parameters (position, intensity, timing) through digital control of the DMD mirrors. Each mirror can be independently controlled to reflect or block light, allowing precise modulation of light beam characteristics to achieve uniform wiring patterns despite the maskless approach
2Adaptability or versatility
If multiple masks are used to form different metal patterns, then pattern diversity is achieved, but manufacturing cost increases
Solution Approach 1:
The digital micro-mirror device serves multiple functions: it can generate any metal pattern configuration (source electrodes, drain electrodes, channel portions with various shapes) by loading different pattern data from graphic data system files. This single device replaces multiple specialized masks, providing universal pattern formation capability while reducing manufacturing cost
Solution Approach 2:
The system transitions from static physical masks to dynamic digital pattern control. The DMD can rapidly reconfigure mirror orientations based on real-time data from graphic data system files, allowing flexible generation of diverse metal patterns without physical mask changes, thereby achieving adaptability without proportional cost increase
3Manufacturing precision
If beams of light are selectively provided to form patterns, then pattern formation capability is improved, but beam inconsistency causes defects
Solution Approach 1:
The system incorporates a control unit that receives pattern data from graphic data system files and precisely controls DMD mirror states accordingly. This closed-loop digital control ensures each light beam is directed with high precision to its intended target, compensating for potential beam inconsistencies and preventing defects such as stains or short circuits in the formed patterns
Solution Approach 2:
The patent replaces the mechanical mask-based light selection system with a digitally controlled optical system. The DMD uses electronically controlled mirror orientations instead of physical mask positioning, allowing precise and consistent beam direction control that eliminates the variability inherent in mechanical mask systems while maintaining excellent pattern formation capability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the occurrence of defects and manufacturing costs by enabling precise pattern formation on display substrates, ensuring uniformity and preventing shorts between source and drain electrodes, thereby enhancing the quality and reliability of the display panels.
Implementation Method 1
a digital micro-mirror device configured to transmit a source beam applied from an exposure source to a substrate
Implementation Method 2
light is irradiated onto an upper surface of the mask so that the photoresist layer is exposed and developed
Data Source
AI summary
A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.