Maskless Exposure Apparatus Using Point Light Array for Patterning
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Solution Overview
Problem
Photolithographic processes face challenges with high energy light exposure, resulting in low patterning resolution and variability in line widths due to incident angle, and are resource-intensive and polluting, necessitating more efficient and precise methods for forming minute patterns.
Innovation Solution
An exposure apparatus and method utilizing pulse event generation (PEG) to provide uniform light radiation, project point lights according to photoresist shapes, inspect patterns for errors, and select optimal PEG for minimal error, enhancing line width uniformity and pattern precision.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If high energy light is directly radiated onto a substrate for patterning, then the patterning process can be performed without masks, but the patterning resolution becomes relatively low and line widths vary based on incident angle
Solution Approach 1:
The patent divides the light source into multiple point light sources arranged in an array, where each point light source corresponds to a specific position in the patterned region. This segmentation allows independent control of light exposure at different locations, enabling precise patterning without masks while maintaining high resolution by controlling each point light's contribution to the overall pattern formation.
2Manufacturing precision
If photolithographic processes are used with masks to form patterns, then patterning resolution can be achieved, but the process generates pollution from developing agents and requires expensive equipment
Solution Approach 1:
The patent extracts and eliminates the mask component from the photolithographic process, replacing it with a direct light source array that projects patterns directly onto the substrate. This removal of the mask eliminates the need for developing agents and associated pollution, while maintaining patterning resolution through precise control of the point light sources.
Solution Approach 2:
The patent replaces the mechanical mask system with an optical direct-write system using point light sources. Instead of using physical masks that require alignment and developing chemicals, the system uses controlled light emission to directly form patterns, substituting a chemical-mechanical process with a purely optical one that avoids pollution.
3Manufacturing precision
If multiple masks are used in photolithographic processes to fabricate the same product, then patterning can be achieved, but the resource consumption and cost increase significantly
Solution Approach 1:
The patent creates a universal patterning system where a single light source array can form various patterns by controlling the illumination timing and intensity of individual point lights. This multi-functional system replaces the need for multiple specialized masks, allowing the same hardware to produce different patterns through software control of the light source array.
Solution Approach 2:
The patent employs preliminary action by pre-calculating and pre-programming the light source activation sequence to form the desired pattern. The control system stores the pattern information and executes it by activating specific point lights at predetermined times, eliminating the need for physical masks and reducing resource consumption while maintaining pattern formation capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution improves the uniformity and precision of pattern formation, reducing exposure errors and increasing processing margins, while minimizing resource consumption and pollution.
Implementation Method 1
The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation
Implementation Method 2
The illuminating member is configured to change the light into point lights
Implementation Method 3
The projecting member is configured to project the point lights according to a photoresist shape extending in various directions
Data Source
AI summary
An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.