Maskless Lithography Using Programmable Particle Patterning
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Solution Overview
Problem
Conventional lithographic apparatuses are inflexible and costly, requiring masks for pattern creation, which limits their application and scalability in manufacturing processes like IC and flat panel display production.
Innovation Solution
A maskless lithographic apparatus utilizing a programmable patterning device with individually addressable elements, such as LEDs, that can generate patterns directly on a substrate without the need for masks, enabling flexible and cost-effective production by depositing particles and applying patterns in a scalable manner.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional mask-based lithographic apparatus is used, then pattern transfer reliability is ensured, but device complexity and manufacturing cost increase due to the need for physical masks
Solution Approach 1:
The patent removes the mask component from the lithographic system entirely, extracting the pattern definition function from a physical object and relocating it to a digital control system that directly manipulates particles (ions, atoms, or molecules) to form patterns on the substrate without requiring a mask
Solution Approach 2:
The patent replaces the mechanical mask system with a field-based particle deposition system, where electric or magnetic fields control particle trajectories to define patterns, substituting mechanical mask manipulation with field-controlled particle routing
2Manufacturing precision
If a conventional mask-based lithographic apparatus is used, then manufacturing precision is maintained, but productivity decreases due to mask change time and limitations
Solution Approach 1:
The patent introduces dynamic reconfigurability to the lithographic system, where the pattern definition is no longer fixed on a static mask but can be dynamically changed by updating digital control parameters that steer particles, enabling rapid pattern changes without physical mask replacement
Solution Approach 2:
The particle source and control system serve multiple functions: generating particles, controlling their trajectories, defining patterns, and depositing them on the substrate, replacing the specialized mask component with a multi-functional digital control system
3Adaptability or versatility
If a maskless lithographic apparatus is used, then adaptability and flexibility improve for rapid pattern changes, but manufacturing precision may be compromised
Solution Approach 1:
The patent incorporates feedback control mechanisms where sensors detect particle positions and deposition patterns in real-time, and the control system adjusts particle steering fields to correct deviations and maintain precise pattern formation despite the absence of a physical mask
Data Source
AI summary
A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.