Maskless Lithography With Programmable Patterning Device
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Solution Overview
Problem
Conventional lithographic apparatuses are inflexible and costly, requiring masks and being unsuitable for rapid pattern changes and use with flexible substrates, limiting their application in modern device manufacturing.
Innovation Solution
A maskless lithographic apparatus featuring a programmable patterning device with individually controllable elements, such as self-emissive contrast devices and a projection system with movable lenses, allowing for flexible and cost-effective pattern creation on various substrates without the need for masks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a conventional mask-based lithographic apparatus is used, then the manufacturing process is stable and reliable, but the system is inflexible, costly, and unsuitable for rapid pattern changes
Solution Approach 1:
The patent removes the mask component entirely from the lithographic system, replacing it with a maskless programmable patterning device. This extraction of the mask eliminates the need for physical mask handling, storage, and alignment mechanisms, thereby reducing device complexity while improving adaptability for rapid pattern changes.
Solution Approach 2:
The patent replaces the mechanical mask-based patterning system with an optical/electronic programmable patterning device. Instead of physically changing masks to alter patterns, the system uses programmable control to dynamically generate different patterns, substituting mechanical operations with electronic control and reducing overall system complexity.
2Adaptability or versatility
If a conventional mask-based lithographic apparatus is used, then the imaging quality is consistent, but the system is costly and unsuitable for flexible substrates
Solution Approach 1:
The patent creates a universal lithographic system that can handle multiple substrate types including flexible substrates. The programmable patterning device and movable lens array provide multi-functional capability to accommodate different substrate geometries and materials without requiring specialized equipment, thereby reducing system cost while improving versatility.
Solution Approach 2:
The patent introduces dynamic elements including movable lens arrays and programmable patterning devices that can adapt in real-time to different substrate types. This dynamic capability allows the system to maintain imaging quality across various substrate formats without requiring multiple fixed configurations, reducing overall system cost while enhancing ease of manufacture for diverse applications.
3Productivity
If maskless lithography is implemented, then pattern change speed and cost are improved, but the system requires programmable patterning devices and beam control mechanisms
Solution Approach 1:
The patent segments the beam control function into individually addressable elements within the programmable patterning device and movable lens array. Each element can be independently controlled to generate and position beams, allowing parallel operation that achieves high pattern change speed while distributing control complexity across multiple simple, modular components rather than requiring a single complex control mechanism.
4Manufacturing precision
If high resolution lithography is achieved, then manufacturing precision is improved, but the system requires precise beam positioning and focusing capabilities
Solution Approach 1:
The patent replaces complex mechanical positioning systems with programmable electronic control of the patterning device and movable lens array. The high positioning precision required for high-resolution lithography is achieved through digital addressing and control of individual elements rather than mechanical adjustment mechanisms, thereby maintaining manufacturing precision while reducing positioning system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-resolution, flexible, and scalable lithography capable of 0.1-10 μm resolution and ≥50 nm overlay, suitable for diverse applications including ICs and flat panel displays, with reduced costs and complexity, and the ability to handle flexible substrates.
Implementation Method 1
a self emissive contrast device configured to emit a plurality of beams
Implementation Method 2
a projection system configured to project at least a portion of the plurality of beams onto the target portion
Implementation Method 3
The apparatus may be provided with a deflector to move the beam with respect to the target portion
Data Source
AI summary
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.