Maskless Lithography Apparatus with Programmable Radiation Arrays
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Solution Overview
Problem
Conventional lithographic apparatuses are inflexible and costly, requiring masks for pattern creation, which limits their application and scalability in manufacturing processes like IC and flat panel display production.
Innovation Solution
A maskless lithographic apparatus utilizing a programmable patterning device with two-dimensional arrays of radiation sources and a projection system that projects modulated radiation onto a substrate, allowing for flexible and cost-effective pattern creation without the need for masks, enabling scalable manufacturing across different substrate sizes and types.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a conventional mask-based lithographic apparatus is used, then manufacturing precision is maintained, but adaptability and flexibility are reduced
Solution Approach 1:
The patent uses a programmable patterning device that creates digital copies of patterns through software control rather than physical masks. The pattern data is stored electronically and can be rapidly changed by updating the digital pattern file, eliminating the need for physical mask fabrication while maintaining pattern fidelity through precise digital control of the radiation sources.
Solution Approach 2:
The invention implements dynamic pattern generation where the patterning device can change patterns in real-time through programming. The radiation sources are dynamically controlled to emit or block radiation based on the desired pattern, allowing rapid reconfiguration between different patterns without physical mask changes, thus achieving both flexibility and precision.
2Ease of manufacture
If masks are used for pattern creation, then manufacturing precision is ensured, but device complexity and cost increase
Solution Approach 1:
The patent extracts the pattern definition function from physical masks and transfers it to a programmable digital system. The patterning device separates the pattern storage (digital memory) from the pattern projection (optical system), allowing patterns to be stored and retrieved electronically without the complexity and cost of physical mask fabrication, handling, and alignment.
Solution Approach 2:
The invention replaces the mechanical mask system with an electronically controlled programmable patterning device. Instead of physically moving and aligning masks, the system uses electronic programming to control radiation sources, substituting mechanical operations with electronic control to reduce complexity and cost while maintaining precision through digital accuracy.
3Adaptability or versatility
If a maskless system with programmable patterning device is used, then adaptability is improved, but device complexity increases
Solution Approach 1:
The patent implements a universal programmable patterning device that can generate multiple different patterns through a single system. The device uses a standardized array of radiation sources that can be programmed to create various patterns, making the system multi-functional and adaptable to different applications without requiring separate specialized equipment for each pattern type.
Solution Approach 2:
The invention segments the patterning function into individually addressable radiation sources arranged in an array. Each radiation source can be independently controlled, allowing the system to build complex patterns from simple controlled elements. This segmentation reduces the overall complexity by breaking down the patterning task into manageable independent units rather than requiring a single complex mechanism.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides a flexible and low-cost lithographic apparatus capable of efficiently manufacturing integrated circuits and flat panel displays by eliminating the need for masks, enabling rapid pattern changes and reducing production costs, while supporting multiple applications with a single platform.
Implementation Method 1
a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device comprising a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam
Implementation Method 2
a projection system configured to project the modulated radiation onto the substrate, the projection system comprising a plurality of optical elements arranged side by side
Data Source
AI summary
An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.