Maskless Lithographic Apparatus Using Programmable Radiation Arrays
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Solution Overview
Problem
Conventional lithographic apparatuses are inflexible and costly, requiring masks and being limited in resolution and overlay capabilities, making them unsuitable for diverse and large-scale substrate applications.
Innovation Solution
A maskless lithographic apparatus utilizing a programmable patterning device with individually controllable elements, such as laser diodes, that can modulate radiation to achieve high resolution and flexibility, allowing for scalable and cost-effective patterning on various substrates without the need for masks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional mask-based lithographic apparatus is used, then manufacturing precision can be achieved, but device complexity and cost increase
Solution Approach 1:
The patent extracts and eliminates the mask component from the lithographic system. By using a maskless programmable patterning device with individually controllable elements, the system removes the physical mask that contributes to complexity while maintaining patterning precision through direct digital control of radiation sources.
Solution Approach 2:
The patent replaces the mechanical mask handling system with a programmable electronic control system. The individually controllable radiation elements (such as laser diodes or LED elements) are controlled through electronic programming, eliminating the need for physical mask fabrication, handling, and alignment mechanisms.
2Manufacturing precision
If a conventional mask-based system is used, then patterning can be achieved, but adaptability decreases
Solution Approach 1:
The patent implements a dynamic, reconfigurable patterning system where individual radiation elements can be independently controlled and programmed. This allows the pattern to be dynamically changed by updating the control signals to each element, providing full adaptability while maintaining manufacturing precision through controlled radiation delivery.
Solution Approach 2:
The patent enables pattern changes by modifying control parameters (such as which radiation elements are activated, their intensity, and timing) rather than changing physical masks. This parameter-based control provides versatile adaptability across different patterning applications while maintaining precise control over the radiation that defines manufacturing precision.
3Adaptability or versatility
If individually controllable radiation elements are used, then adaptability improves, but device complexity increases
Solution Approach 1:
The patent employs a uniform array of individually controllable radiation elements that can serve multiple patterning functions. Each element in the array is identical in structure but independently addressable, allowing the same hardware configuration to generate diverse patterns through programming, thereby reducing overall system complexity compared to having specialized components for each pattern type.
Solution Approach 2:
The patent uses an array of identical, replicated radiation elements (such as laser diodes or LED elements) that can be individually controlled. This replication approach simplifies the control system by using the same control architecture for each element, and the modular nature allows scaling without proportionally increasing complexity.
4Ease of manufacture
If maskless programmable patterning is used, then cost decreases, but manufacturing precision may be compromised
Solution Approach 1:
The patent replaces expensive mechanical mask systems with a programmable electronic control system that directly drives individual radiation elements. This substitution eliminates mask fabrication and handling costs while maintaining precision through electronic control, achieving cost reduction without sacrificing patterning precision.
Solution Approach 2:
The patent maintains manufacturing precision by controlling radiation parameters (intensity, timing, spatial distribution) through programming rather than physical masks. This parameter-based control allows precise patterning while eliminating the costs associated with mask fabrication, storage, and handling, achieving cost reduction without precision compromise.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-resolution patterning with flexible overlay capabilities across large substrates, reducing costs and complexity while supporting multiple applications with a single platform, including ICs, flat panel displays, and packaging.
Implementation Method 1
individually controllable elements, such as laser diodes, that can modulate radiation
Data Source
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AI summary
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.