Maskless Lithography Using Programmable Spatial Light Modulator
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Solution Overview
Problem
Conventional lithographic apparatuses are inflexible and costly, requiring masks for pattern creation, which limits their ability to quickly change or produce complex patterns efficiently, especially in manufacturing integrated circuits and flat panel displays.
Innovation Solution
A maskless lithographic apparatus using a programmable patterning device with a plurality of individually addressable radiation sources, such as LEDs, to modulate radiation beams of varying spot sizes, allowing for flexible pattern creation and projection onto substrates with relative motion, enabling efficient manufacturing of complex patterns without the need for masks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional mask-based lithographic apparatus is used, then pattern transfer reliability is improved, but manufacturing flexibility and adaptability deteriorate due to the need for physical masks
Solution Approach 1:
The patent replaces physical masks with a programmable patterning device that optically copies desired patterns directly onto the substrate. The spatial light modulator acts as a software-controlled pattern generator, eliminating the need for physical mask fabrication and changing while maintaining reliable pattern transfer through optical imaging.
Solution Approach 2:
The patent introduces dynamic programmability to the lithographic system through a spatial light modulator that can be electronically reconfigured. This allows the patterning device to dynamically switch between different patterns without physical changes, enabling rapid adaptation while maintaining consistent optical performance for reliable pattern transfer.
2Manufacturing precision
If masks are used for pattern creation, then manufacturing precision is improved, but production time and cost increase due to mask fabrication and changing
Solution Approach 1:
The patent eliminates time-consuming mask fabrication by using a programmable spatial light modulator that stores and retrieves digital pattern data. Desired patterns are optically copied from the programmable device to the substrate, allowing instant pattern changes without physical mask production cycles.
Solution Approach 2:
The patent performs preliminary pattern preparation in the form of digital data stored in the programmable patterning device. Patterns are pre-programmed into the spatial light modulator's memory, allowing rapid recall and projection without physical mask handling, thereby reducing production time while maintaining precision.
3Adaptability or versatility
If a programmable patterning device with multiple spot sizes is used, then manufacturing flexibility and adaptability are improved, but device complexity increases
Solution Approach 1:
The patent segments the radiation source into multiple independent light-emitting elements with different spot sizes. Each element can be independently controlled to produce specific pattern features, allowing complex patterns to be built from simpler modular components rather than requiring a single complex source.
Solution Approach 2:
The patent designs the programmable patterning device to perform multiple functions through a unified structure. The same spatial light modulator array can generate patterns of varying spot sizes and configurations, eliminating the need for separate devices for different pattern types and reducing overall system complexity.
4Productivity
If multiple radiation sources with different spot sizes are used, then productivity is improved through parallel pattern processing, but device complexity and cost increase
Solution Approach 1:
The patent merges multiple radiation sources with different spot sizes into a single integrated programmable patterning device. The spatial light modulator array combines the functionality of multiple sources while maintaining their individual characteristics, enabling parallel pattern processing without the complexity of separate source systems.
Solution Approach 2:
The patent creates a universal programmable patterning device that can perform the work of multiple specialized sources. By programming different elements of the spatial light modulator array, the same device can generate various spot sizes and patterns simultaneously, improving productivity without increasing the number of physical devices.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides a low-cost, flexible, and scalable method for manufacturing integrated circuits and flat panel displays by allowing rapid pattern changes and complex pattern creation, reducing production time and costs by eliminating the need for masks and enhancing substrate processing efficiency.
Implementation Method 1
A maskless lithographic apparatus uses a programmable patterning device with a plurality of individually addressable radiation sources, such as LEDs
Data Source
AI summary
A method and apparatus to provide a plurality of radiation beams modulated according to at least two sub patterns of a pattern using radiation sources, the radiation sources producing radiation beams of at least two spot sizes such that each of the radiation beams having a same spot size of the at least two spot sizes is used to produce one of the at least two sub patterns, project the plurality of beams onto a substrate, and provide relative motion between the substrate and the plurality of radiation sources, in a scanning direction to expose the substrate. A method and apparatus to provide radiation modulated according to a desired pattern using a plurality of rows of two-dimensional arrays of radiation sources, project the modulated radiation onto a substrate using a projection system, and remove fluid from between the projection system and the substrate using one or more fluid removal units.