Integrated Mass Flow Controller for Precise Semiconductor Fluid Delivery

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Solution Overview

Problem

Current mass flow control technologies in semiconductor chip fabrication face challenges in delivering precise and adjustable flow rates of process gases and liquids, particularly in compact and complex systems.

Innovation Solution

The system incorporates a mass flow controller with a body, valve, flow restrictor, and pressure sensor, featuring a valve with a seat, closure member, biasing element, and actuators to control fluid flow, and a pressure sensor to measure pressure within a defined volume, enabling precise control and adjustment of flow rates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If a mass flow controller is designed with compact dimensions to reduce physical space, then the device complexity increases due to tighter integration of components

Engineering Contradiction:
Improvephysical spaceVSAvoiddevice complexity
Core Design Contradiction:
Volume of moving objectVSDevice complexity

Solution Approach 1:

The patent combines multiple flow control functions (valve, flow restrictor, pressure sensor, actuators) into a single integrated mass flow controller housing. This merging of components achieves compact dimensions while managing complexity through functional integration rather than separate discrete units.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent employs a nested arrangement where the flow restrictor is positioned within the flow path between the valve and processing chamber, and the pressure sensor is integrated into the housing to measure pressure at specific locations. This nesting of functional elements within the compact structure reduces overall volume while maintaining distinct functional zones.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Volume of moving object

If the flow control apparatus is made more compact, then the manufacturing precision requirements increase to ensure proper component alignment and function

Engineering Contradiction:
Improvephysical spaceVSAvoidmanufacturing precision
Core Design Contradiction:
Volume of moving objectVSManufacturing precision

Solution Approach 1:

The patent applies local quality by providing specific structural features at critical locations: the valve seat is formed with precise geometry in the flow path, the flow restrictor has a specifically designed aperture size and shape, and the pressure sensor is positioned at a precise location between the valve and flow restrictor. These localized precision features ensure proper function while the overall compact design is achieved through functional integration.

Inventive Principle:
Principle #3Local quality

3Adaptability or versatility

If multiple process gases and liquids are handled in the same fabrication tool, then the device complexity increases to manage multiple fluid pathways and control mechanisms

Engineering Contradiction:
Improverange of flow capabilityVSAvoiddevice complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent designs the mass flow controller with universal functionality to handle multiple process gases and liquids through the same device. The flow path, valve, flow restrictor, and pressure sensor are configured to work with various fluids, eliminating the need for separate control devices for each fluid type and reducing overall system complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables accurate and repeatable control of fluid flows, meeting the increasing demands of semiconductor fabrication by ensuring precise delivery of process gases and liquids, even in compact and complex systems.

Implementation Method 1

The valve has a seat and a closure member. The flow restrictor has a flow impedance and is located within the flow path. The biasing element biases the closure member into contact with the seat.

Methodology Applied
Scientific EffectElasticity: Elasticity

Implementation Method 2

The first actuator is configured to apply a first force to the biasing element. The second actuator is configured to apply a second force to the biasing element.

Methodology Applied
Scientific EffectMechanical Force: Mechanical Force

Implementation Method 3

The pressure sensor is configured to measure pressure within a volume between the seat of the valve and the flow restrictor.

Methodology Applied
Scientific EffectPressure measurement:

Data Source

PatentUS20250132170A1Systems and apparatus for controlling fluid flow
Publication Date: 2025.04.24 ICHOR SYSTEMS INC
  • US20250132170A1 patent drawing
  • US20250132170A1 patent drawing
  • US20250132170A1 patent drawing

AI summary

Systems for processing articles are essential for semiconductor fabrication. These systems employ a variety of apparatuses for controlling flow. In one implementation, an apparatus for controlling flow may utilize a body having a flow path extending from an inlet to an outlet. A valve, a flow restrictor, and a pressure sensor are operably coupled to the flow path. The valve incorporates first and second actuators which enable control of mass flow rates of fluid flowing through the flow path.