Mass Spectrometry System Segmented Ion Beam and Laser Analysis
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Solution Overview
Problem
Conventional mass spectrometry systems face challenges in minimizing sample damage and unnecessary signal generation in low-mass areas, particularly when using ion beams for analysis, which can degrade accuracy and efficiency.
Innovation Solution
A mass spectrometry system and method that combines ion beam sputtering with laser ionization, where a first process determines position information of sample materials using an ion or laser beam, followed by a second process that uses alternating ion and laser beams with varying output values to analyze the sample, minimizing damage and signal interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If an ion beam is used for sputtering and ionization in SIMS analysis, then the analysis coverage and ionization efficiency are improved, but sample damage is severe and unnecessary signals are generated in low-mass areas
Solution Approach 1:
The patent divides the irradiation process into two distinct stages: a first process using an ion beam for sputtering and position determination, and a second process using a laser beam for ionization and analysis. This segmentation allows each method to be optimized for its specific function, reducing the harmful effects of using ion beams for both purposes simultaneously.
Solution Approach 2:
The patent implements periodic alternation between ion beam irradiation and laser beam irradiation. The ion beam is applied periodically for sputtering material layers, followed by periodic laser irradiation for ionization and detection. This periodic action pattern minimizes continuous sample exposure to damaging ion beams while maintaining analysis effectiveness.
2Device complexity
If only an ion beam is used for SIMS analysis, then the process is simple, but unnecessary signals are generated in low-mass areas degrading analysis accuracy
Solution Approach 1:
The analysis process is segmented into two distinct phases: sputtering phase using ion beam and ionization phase using laser beam. This segmentation eliminates the generation of unnecessary low-mass signals that occur when ion beams are used for both sputtering and ionization, thereby improving measurement precision while maintaining reasonable process complexity.
Solution Approach 2:
The patent introduces a laser beam as an intermediary tool for ionization, replacing the direct use of ion beams for both sputtering and ionization. This intermediary approach prevents the generation of spurious signals in the low-mass region while maintaining the essential functions of material removal and ionization.
3Productivity
If a high output beam is used for rapid analysis, then the analysis speed is improved, but sample damage increases
Solution Approach 1:
The patent segments the beam application into two functional parts: ion beam for mechanical sputtering at controlled rates, and laser beam for rapid ionization. This allows the analysis to proceed rapidly through efficient laser ionization without requiring high-power continuous ion beam exposure, thus maintaining analysis speed while reducing sample damage.
Solution Approach 2:
The patent replaces the mechanical ion beam-based ionization system with an optical laser-based ionization system. This substitution allows for faster ionization processes with reduced mechanical stress and damage to the sample, improving analysis speed while minimizing harmful effects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces sample damage and unnecessary signal generation, enabling faster and more accurate analysis with improved resolution in mass, depth, and imaging of bio or organic materials by distinguishing material changes and adjusting beam outputs accordingly.
Implementation Method 1
a first process that determines position information of materials included in the sample by irradiating an ion beam to a portion of the sample
Implementation Method 2
ionizing the sample using a laser
Data Source
AI summary
A mass spectrometry system includes a sample holder provided in a vacuum changer and on which a sample is disposed, an irradiator configured to perform sputtering or ionization on the sample, an analyzer configured to analyze an ionized sample generated from the sample by the irradiator, and a controller configured to control the irradiator or the analyzer and perform a first process and a second process. The first process is to determine position information of materials in the sample by irradiating a laser or ion beam to a portion of the sample, and the second process is to irradiate a laser or ion beam of a first output value to another portion of the sample in a section in which the materials in the sample change and irradiate a laser or ion beam of a second output value in other sections.