Master Diffraction Grating Marking for Replica Authentication
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Solution Overview
Problem
The existing methods for manufacturing master diffraction gratings do not provide a means to easily distinguish genuine replica diffraction gratings from counterfeit ones, as they rely on the master diffraction grating as a matrix, and there is no effective way to verify the authenticity of replica diffraction gratings produced using these matrices.
Innovation Solution
A device and method that form a master diffraction grating with a light source unit and a reflecting member to create a resist pattern using both a first and second interference fringe, allowing for the projection of a mark on the replica diffraction grating when irradiated with specific light, enabling easy verification of authenticity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a master diffraction grating is used as a matrix for manufacturing replica diffraction gratings, then mass production of replica diffraction gratings is enabled, but there is no means to distinguish genuine replica diffraction gratings from counterfeit ones
Solution Approach 1:
A mark is formed on the master diffraction grating during the manufacturing process, before the replica diffraction gratings are produced. This preliminary marking ensures that the authentication feature is already embedded in the master matrix, and will be automatically transferred to all genuine replicas during the replication process, enabling authenticity verification without adding complexity to the mass production workflow
Solution Approach 2:
The mark formed on the master diffraction grating is copied along with the grating pattern onto the replica diffraction gratings during the replication process. This copying mechanism ensures that all genuine replicas inherit the authentication feature from the master, allowing verification of authenticity through the presence of the mark while maintaining the efficiency of mass production
2Device complexity
If a resist pattern is formed using only a first interference fringe from direct light irradiation, then the manufacturing process is simple, but no authentication mark can be projected for counterfeit detection
Solution Approach 1:
The patent combines two light paths - direct light irradiation forming a first interference fringe and reflected light irradiation forming a second interference fringe - to create a resist pattern that incorporates both the grating pattern and an authentication mark. This merging of multiple light functions into a single exposure process achieves counterfeit detection capability without significantly increasing device complexity
Solution Approach 2:
The light source unit is designed to perform multiple functions: it directly irradiates the photoresist layer to form the grating pattern through the first interference fringe, and also irradiates the reflecting member to create the second interference fringe that forms the authentication mark. This multi-functionality enables both manufacturing and authentication features to be created in a single process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the easy identification of counterfeit replica diffraction gratings by projecting a mark corresponding to the reflected light from the reflecting member, thereby ensuring the authenticity of the replica diffraction gratings produced using the master diffraction grating as a matrix.
Implementation Method 1
The light source unit forms a first interference fringe by irradiating a substrate surface of a master substrate with light
Implementation Method 2
The reflecting member reflects light from the light source unit reflected on the substrate surface of the master substrate and guides the light again to the substrate surface, so that a second interference fringe is formed
Data Source
AI summary
A device for producing a master diffraction grating includes a light source unit and a reflecting member 11. The light source unit forms a first interference fringe by irradiating a substrate surface of a master substrate 101 with light. The reflecting member 11 reflects the light from the light source unit reflected on the substrate surface of the master substrate 101 and guides the light again to the substrate surface side to form a second interference fringe. A resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate 101.