Master Manufacturing Method for Uniform Macro-Micro Concave-Convex Structures
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Solution Overview
Problem
Existing methods for forming macro and micro concave-convex structures on substrates suffer from low in-plane uniformity and excessive film thickness variations, making it difficult to uniformly superimpose these structures.
Innovation Solution
A master manufacturing method involving the formation of a periodic micro concave-convex structure on a base material, followed by the deposition of an inorganic resist layer and an organic resist layer with a diluent, allowing for etching to create both macro and micro concave-convex structures uniformly, using different etching gases for anisotropic dry etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If the micro concave-convex structure is superimposed and formed on the substrate on which is formed the macro concave-convex structure, then anti-glare properties are improved, but in-plane uniformity of the micro concave-convex structure deteriorates
Solution Approach 1:
The patent segments the resist layer into two distinct layers: an inorganic resist layer for forming the micro concave-convex structure and an organic resist layer for forming the macro concave-convex structure. This segmentation allows each layer to be optimized for its specific function, with the inorganic resist providing precise nanometer-scale patterning and the organic resist providing the macro-scale structure, thereby resolving the contradiction between anti-glare properties and in-plane uniformity
Solution Approach 2:
The patent applies local quality by using different materials with different properties at different locations in the resist structure. The inorganic resist layer (e.g., silicon oxide, silicon nitride) provides local precision for the micro structure, while the organic resist layer (e.g., photoresist) provides local flexibility for the macro structure. This local differentiation enables simultaneous achievement of high uniformity and effective anti-glare properties
2Ease of manufacture
If an organic layer is formed to embed the micro concave-convex structure, then the macro concave-convex structure can be superimposed, but film thickness variations increase, making uniform superimposition difficult
Solution Approach 1:
The patent introduces an inorganic resist layer as an intermediary between the substrate and the organic resist layer. This intermediary layer serves as a stable foundation that maintains precise dimensional relationships for the micro concave-convex structure while allowing the organic resist layer to be formed with controlled thickness. The inorganic resist layer acts as a mediator that prevents direct transmission of thickness variations from the organic layer to the micro structure, thereby enabling uniform superimposition
3Ease of manufacture
If a thick organic resist layer is used to form the macro concave-convex structure, then the structure can be formed, but etching variations increase, making uniform etching difficult
Solution Approach 1:
The patent replaces the conventional single-layer organic resist system with a dual-layer system comprising an inorganic resist layer and an organic resist layer. This substitution allows the etching process to be decoupled into two stages: first etching through the organic resist layer to form the macro structure, then etching through the inorganic resist layer to form the micro structure. This mechanical and chemical separation of etching steps eliminates the problem of excessive etching depth and variations that occur with thick single-layer organic resist
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the uniform superimposition of macro and micro concave-convex structures, improving anti-reflection and anti-glare properties while maintaining high production efficiency and reducing etching variations.
Implementation Method 1
a step of etching the organic resist layer, the inorganic resist layer, and the master body, to thereby superimpose and form the micro concave-convex structure and the macro concave-convex structure on the surface of the base material
Data Source
AI summary
There is provided a master, an optical body, and a master manufacturing method, including: forming, on a surface of a master body that includes a base material, a periodic micro concave-convex structure in which an average cycle of concavities and convexities is less than or equal to visible light wavelengths; forming an inorganic resist layer on the surface of the master body; microparticulating and spraying an organic resist dissolved in a diluent onto the inorganic resist layer, to thereby form an organic resist layer, on a surface of which is provided a macro concave-convex structure in which the average cycle of concavities and convexities is greater than the visible light wavelengths; and etching the organic resist layer, the inorganic resist layer, and the master body, to thereby superimpose and uniformly form the micro concave-convex structure and the macro concave-convex structure on the surface of the base material.