Matte Resin Composition for Artificial Nails

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing nail makeup materials, such as nail polishes and glazes, face issues like prolonged drying time, difficulty in thickly coating, and health hazards from organic solvents. Additionally, glossy artificial nails have low manual polishing efficiency and produce powder, polluting the environment.

Innovation Solution

A matte resin composition comprising a photoinitiator, a matting agent, an optional diluent, an optional corrosive agent, and polyurethane (methyl) acrylate, which achieves a high adhesion force without polishing and provides an excellent matting effect without additional coatings.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If a glossy surface is used for artificial nails, then the surface appearance is smooth and shiny, but the adhesion force is low and manual polishing is required which reduces efficiency

Engineering Contradiction:
Improveadhesion forceVSAvoidmanual polishing efficiency
Core Design Contradiction:
StrengthVSProductivity

Solution Approach 1:

The invention changes the surface parameter from glossy to matte by controlling the refractive index difference between the resin and filler particles. This parameter change inherently provides both the desired matte appearance and high adhesion force, eliminating the need for manual polishing and significantly improving productivity

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention uses a composite resin composition containing inorganic filler particles with specific refractive index (1.4-1.6) dispersed in an organic polymer matrix. This composite structure creates the matte effect through light scattering while the chemical composition ensures high adhesion to the artificial nail surface without requiring additional polishing steps

Inventive Principle:
Principle #40Composite materials

2Ease of operation

If organic solvents are used in nail makeup materials, then the coating can be applied smoothly, but the drying time is prolonged and health hazards occur

Engineering Contradiction:
Improvecoating applicationVSAvoiddrying time
Core Design Contradiction:
Ease of operationVSLoss of time

Solution Approach 1:

The invention changes the chemical composition parameter by replacing organic solvent-based formulations with a UV-curable resin system. This parameter change enables smooth coating application through UV photopolymerization without the need for prolonged drying time, as the curing process occurs instantaneously upon UV exposure

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention substitutes the evaporation-based drying mechanism (mechanical/physical process) with a UV photopolymerization mechanism (chemical process). This substitution eliminates the time-consuming evaporation of organic solvents and replaces it with rapid UV-induced crosslinking, significantly reducing drying time while maintaining ease of application

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Ease of repair

If organic solvents are used as peeling agents, then the coating film can be removed, but health damage occurs from inhalation and skin absorption

Engineering Contradiction:
Improvepeeling processVSAvoidhealth damage
Core Design Contradiction:
Ease of repairVSObject-affected harmful factors

Solution Approach 1:

The invention changes the chemical parameter of the peeling agent from organic solvents (acetone, ethyl acetate, butyl acetate) to water-based or alcohol-based solutions. This parameter change maintains the effectiveness of the peeling process while eliminating the health hazards associated with inhalation and skin absorption of toxic organic solvents

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention converts a potentially harmful process (use of toxic organic solvents for peeling) into a safe process by using water or alcohol-based peeling agents. The peeling effectiveness is maintained while the harmful effects are eliminated, turning a harmful practice into a safe and environmentally friendly alternative

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The matte resin composition exhibits excellent matting and adhesion properties, reducing the need for polishing and adhesive layers, while also minimizing environmental pollution. It allows for efficient manicure completion without the drawbacks of glossy nails and organic solvents.

Implementation Method 1

a photoinitiator

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Implementation Method 2

a matting agent

Methodology Applied
Scientific EffectLight scattering: Scattering

Data Source

PatentUS20250084277A1Matte resin composition, preparation method thereof, matte film and artificial nail
Publication Date: 2025.03.13 ZHONGSHAN SENBOMA ARTWARE CO LTD
  • US20250084277A1 patent drawing
  • US20250084277A1 patent drawing
  • US20250084277A1 patent drawing

AI summary

The present disclosure provides a matte resin composition, a preparation method thereof, a matte film, and an artificial nail. The matte resin composition comprises: a photoinitiator, a matting agent, an optional diluent, an optional corrosive agent, and polyurethane (methyl) acrylate, where a monomer of the polyurethane (methyl) acrylate has a functionality between 2 and 6; and/or the polyurethane (methyl) acrylate has a molecular weight between 1000 and 2000 Da. The matte resin composition disclosed herein exhibits excellent matting effect and may achieve such matting effect without coating additional substances. Moreover, the matte resin composition disclosed herein demonstrates high adhesion force without polishing during usage.