Membrane Vapor Delivery for Microelectronics

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Solution Overview

Problem

Conventional methods for delivering liquid vapor in micro-electronics and medical applications introduce contaminants and have limited control and accuracy, especially at lower flow rates, and fail to provide purification of the vaporized liquid.

Innovation Solution

A device with an enclosed chamber and a membrane that allows controlled vaporization of liquid into a gas stream by modulating temperature, pressure, and carrier gas flow, using a perfluorinated ion-exchange membrane like NAFION, to produce a purified gas stream with precise control over vapor concentration.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If direct liquid injection (DLI) is used to deliver vapor, then vapor delivery capability is provided, but contaminants are introduced into the process

Engineering Contradiction:
Improvevapor delivery capabilityVSAvoidcontaminant introduction
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

A membrane is introduced as an intermediary between the liquid source and the carrier gas. The membrane allows vapor molecules to pass through while blocking larger contaminant molecules, thus enabling vapor delivery without introducing contaminants into the process

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention employs a porous membrane with specific pore sizes that permit vapor transmission while excluding contaminants. The membrane's porous structure enables selective passage based on molecular size, resolving the contradiction between vapor delivery and contaminant exclusion

Inventive Principle:
Principle #31Porous materials

2Object-affected harmful factors

If bubblers are used for vapor delivery, then some contaminant entrainment is reduced, but control accuracy and precision deteriorate

Engineering Contradiction:
Improvecontaminant entrainmentVSAvoidcontrol accuracy
Core Design Contradiction:
Object-affected harmful factorsVSMeasurement precision

Solution Approach 1:

The invention replaces the mechanical bubbling system with a membrane-based vapor transmission system. This substitution eliminates the need for precise control of bubble formation, liquid level, and thermal droop, thereby improving control accuracy while maintaining contaminant exclusion benefits

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Productivity

If conventional boiling methods are used to produce water vapor, then vapor production is achieved, but dissolved gases and aerosols are introduced as impurities

Engineering Contradiction:
Improvevapor productionVSAvoiddissolved gases and aerosols
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The membrane serves as an intermediary that selectively transmits vapor molecules while blocking dissolved gases and aerosol particles. This resolves the contradiction by enabling continuous vapor production without introducing the impurities that conventional boiling methods generate

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device enables precise and purified delivery of vaporized liquids, reducing contamination and improving control over vapor concentration, suitable for critical processes like micro-electronics manufacturing and medical applications.

Implementation Method 1

a membrane surrounding the tubular support, wherein the membrane is configured to permit passage therethrough of a vapor phase of the liquid

Methodology Applied
Scientific EffectPermeation: Permeation

Implementation Method 2

controlled vaporization of liquid into a gas stream by modulating temperature, pressure, and carrier gas flow

Methodology Applied
Scientific EffectEvaporation: Evaporation

Data Source

PatentUS11458412B2Controlled vapor delivery into low pressure processes
Publication Date: 2022.10.04 RASIRC INC
  • US11458412B2 patent drawing
  • US11458412B2 patent drawing
  • US11458412B2 patent drawing

AI summary

Provided herein are methods, systems, and device for control, delivery, and purification of low vapor pressure gases in conjunction with carrier gas in micro-electronics and other critical process applications. The present invention is based on the observation that when temperature and pressure of a device for delivering a gas stream are held constant, the concentration of vapor in the gas stream may be modulated based on the level of liquid within the chamber thereof.