Stacked Memory Capacitor Structure for Edge Stress Relief

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Solution Overview

Problem

High-density semiconductor memory devices with stacked capacitors face structural damages and reliability issues due to stress susceptibility, which affects their performance and integrity.

Innovation Solution

The capacitors in the semiconductor memory device are fabricated with tilted sidewalls and misaligned upper portions to alleviate stress, using a middle supporting layer to define upper and lower portions, and a planarization layer to adjust stress, reducing structural damage and enhancing reliability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If stacked capacitors are formed with increased vertical heights to increase capacitance, then device performance is improved, but structural damages and reliability are degraded due to higher stress impact

Engineering Contradiction:
Improvedevice reliabilityVSAvoidstress in capacitor array structure
Core Design Contradiction:
ReliabilityVSStress or pressure

Solution Approach 1:

The capacitor array structure employs asymmetric design by tilting capacitors near the sidewall of the array structure. This tilting creates an asymmetric stress distribution that alleviates concentrated stress in critical regions, thereby improving reliability while maintaining the high capacitance achieved through increased vertical heights

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The invention applies local quality by selectively tilting only the capacitors near the sidewall of the capacitor array structure, while other capacitors may remain upright. This localized modification targets the specific region where stress concentration occurs, optimizing stress relief without compromising the overall capacitance performance of the entire array

Inventive Principle:
Principle #3Local quality

2Reliability

If stacked capacitors are formed with increased vertical heights to increase capacitance, then device performance is improved, but structural damages occur due to higher stress impact

Engineering Contradiction:
Improvedevice reliabilityVSAvoidstress-induced damages
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The asymmetric tilting of sidewall capacitors creates a stress-relief mechanism that prevents stress-induced damages. The tilted configuration redistributes mechanical stresses away from vulnerable regions, reducing the occurrence of structural damages while preserving the high-capacitance design

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The tilting design acts as a preventive measure that cushions against potential stress-induced damages before they occur. By pre-configuring the capacitor array with tilted sidewall capacitors, the structure is prepared to withstand stress impacts that would otherwise cause structural damages in conventional upright designs

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

Data Source

PatentUS20240057310A1Semiconductor memory device
Publication Date: 2024.02.15 FUJIAN JINHUA INTEGRATED CIRCUIT CO LTD
  • US20240057310A1 patent drawing
  • US20240057310A1 patent drawing
  • US20240057310A1 patent drawing

AI summary

A semiconductor memory device includes a substrate, and a plurality of contact pads and a capacitor array structure disposed on an array region of the substrate. The capacitor array structure includes a plurality of capacitors respectively disposed on the contact pads and a middle supporting layer extending laterally between waist portions of the capacitors to define an upper portion and a lower portion of each of the capacitors. The lower portions of the capacitors near the edge of the array region are tilted. The upper portions of the capacitors near the edge of the array region have misalignments to the contact pads. The stress in the capacitor array structure of the semiconductor memory device may be reduced.