Memory Device Contact Resistance Compensation

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Solution Overview

Problem

Conventional memory devices experience resistance differences due to position-dependent line resistances, leading to reduced data accuracy and increased chip size, manufacturing complexity, and production costs when attempting to address these issues.

Innovation Solution

The memory device design includes a memory unit with conductive lines and driving units where the contacts' resistance values decrease as the conductive lines move farther from the driving units, reducing resistance differences by strategically positioning contacts and junction regions to control internal resistances.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the memory unit size is decreased to reduce resistance difference, then data accuracy is improved, but chip size increases and manufacturing complexity increases

Engineering Contradiction:
Improvedata accuracyVSAvoidmanufacturing complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent applies local quality by making the contact resistance values position-dependent within the memory unit. Specifically, contacts closer to the driving unit have higher resistance values while contacts farther away have lower resistance values. This non-uniform resistance distribution compensates for the position-dependent line resistance differences, thereby improving data accuracy without requiring a smaller memory unit size or increasing manufacturing complexity.

Inventive Principle:
Principle #3Local quality

2Measurement precision

If the resistance of variable resistance unit is increased to address line resistance difference, then data accuracy is improved, but on/off ratio of memory cells is lowered

Engineering Contradiction:
Improvedata accuracyVSAvoidon/off ratio
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

Instead of uniformly increasing the resistance of the variable resistance unit, the patent applies local quality by assigning different resistance values to different contacts based on their positions. Contacts farther from the driving unit (which experience higher line resistance) have lower contact resistance values, while contacts closer to the driving unit have higher contact resistance values. This localized adjustment compensates for line resistance differences while maintaining the on/off ratio performance.

Inventive Principle:
Principle #3Local quality

3Measurement precision

If contacts are positioned to reduce resistance difference, then data accuracy is improved, but chip size increases

Engineering Contradiction:
Improvedata accuracyVSAvoidchip size
Core Design Contradiction:
Measurement precisionVSArea of stationary object

Solution Approach 1:

The patent applies parameter changes by modifying the resistance values of contacts based on their positions within the memory unit. Rather than physically repositioning contacts or changing the memory unit dimensions, the invention changes the electrical resistance parameter of each contact to compensate for position-dependent line resistance differences. This allows data accuracy improvement without increasing chip size.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS8675386B2Memory device having resistance unit
Publication Date: 2014.03.18 SK HYNIX INC
  • US8675386B2 patent drawing
  • US8675386B2 patent drawing
  • US8675386B2 patent drawing

AI summary

A memory device includes a memory unit including a plurality of first conductive lines and a plurality of second conductive lines that cross the first conductive lines, and a driving unit module coupled with the plurality of the first conductive lines through respective ones of a plurality of contacts and coupled with and the plurality of the second conductive lines through respective ones of the plurality of contacts, wherein as the first conductive lines become farther from the driving unit module along a direction that the second conductive lines extend, the respective contacts of the first conductive lines have lower resistance values.