Memory IC Backside Power Delivery for Nanowire Scaling

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Solution Overview

Problem

The scaling of multi-gate and nanowire transistors in integrated circuits poses challenges in lithographic processes, leading to trade-offs between feature dimension and spacing, and traditional front-side power delivery methods increase power network resistance and energy consumption, complicating high-bandwidth computing.

Innovation Solution

Implementing backside power delivery in integrated circuit structures, which allows for independent synthesis of power and signal lines, reducing power network resistance and energy consumption, and enabling more aggressive scaling and compact design.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If front-side power delivery is used, then power can be delivered to devices, but power network resistance and energy consumption increase

Engineering Contradiction:
Improveenergy consumptionVSAvoidpower network resistance
Core Design Contradiction:
Loss of energyVSReliability

Solution Approach 1:

The patent delivers power from the backside of the substrate rather than the front side, utilizing the third dimension (vertical depth) to create separate power and signal pathways. This dimensional change allows power to be delivered through dedicated backside interconnect structures directly to device regions, reducing the horizontal current path length and associated resistance on the front side, thereby lowering energy consumption in the power network.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If feature dimensions are scaled down to increase device density, then more devices can be fabricated on a chip, but lithographic process constraints become overwhelming

Engineering Contradiction:
Improvedevice densityVSAvoidlithographic process constraints
Core Design Contradiction:
ProductivityVSEase of manufacture

Solution Approach 1:

The patent employs three-dimensional device structures (such as FinFETs or nanowire transistors with vertical channels) that extend in the vertical dimension rather than relying solely on horizontal scaling. This allows device density to increase through vertical stacking and multi-layer interconnects, thereby reducing the lithographic resolution requirements for patterning while maintaining high device density on the chip.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Device complexity

If power and signal lines are synthesized together, then routing is simplified, but power network resistance increases

Engineering Contradiction:
Improverouting complexityVSAvoidpower network resistance
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent segments the power delivery function from signal routing by implementing separate backside power interconnect structures and frontside signal interconnect structures. This segmentation allows each network to be independently optimized - power lines can be designed with wider cross-sections and lower resistance paths on the backside, while signal lines maintain their routing flexibility on the frontside, thereby reducing overall power network resistance without excessive routing complexity.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS20230420368A1Integrated circuit structures having memory with backside power delivery
Publication Date: 2023.12.28 INTEL CORP
  • US20230420368A1 patent drawing
  • US20230420368A1 patent drawing
  • US20230420368A1 patent drawing

AI summary

Structures having memory with backside power delivery are described. In an example, an integrated circuit structure includes a front-side structure including a device layer having a plurality of nanowire-based transistors, and a plurality of metallization layers above the nanowire-based transistors of the device layer. One of the metal layers includes an array of uninterrupted signal lines. A backside structure is below the nanowire-based transistors of the device layer. The backside structure includes a ground metal line.