Memristor Oxygen-Depleted Region Formation via Sink Layer

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current methods face difficulties in uniformly forming oxygen-depleted regions in metal oxide materials for memristor and RRAM cells, which affects the consistency and efficiency of memory cell formation across a memory array.

Innovation Solution

The use of an oxygen-sink material layered over a metal oxide material, where oxygen is transferred to form an oxygen-depleted region, subdividing the metal oxide into regions with varying oxygen concentrations, thereby creating a memory cell structure that can be thermally or electrically treated to achieve a self-limiting thickness for the depletion region.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If oxygen-depleted regions are formed by direct deposition methods, then memory cell formation can be achieved, but uniformity and consistency across the memory array deteriorate

Engineering Contradiction:
Improveuniformity of oxygen-depleted region formationVSAvoidefficiency of memory cell formation across memory array
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

An oxygen-sink material layer is introduced as an intermediary between the metal oxide material and the upper electrode. This oxygen-sink material acts as a mediator that selectively absorbs oxygen during thermal or electrical treatment, enabling controlled formation of oxygen-depleted regions in the metal oxide material below. The intermediary layer facilitates uniform oxygen depletion across the entire memory array area, resolving the contradiction between manufacturing precision and productivity.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The oxygen-sink material layer is deposited beforehand onto the metal oxide material before final memory cell formation. This preliminary action prepares the structure for subsequent uniform oxygen depletion by positioning the oxygen-absorbing material in advance, allowing consistent formation of oxygen-depleted regions across the entire array during a single thermal or electrical treatment step.

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If oxygen-sink material is used to transfer oxygen and form depleted regions, then uniformity of memory cell formation is improved, but device structure complexity increases

Engineering Contradiction:
Improveconsistency of memory cell formationVSAvoidstructure complexity of memory cell
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The oxygen-sink material layer undergoes parameter changes during thermal or electrical treatment, transitioning from a metallic state to an oxidized state as it absorbs oxygen from the metal oxide material. This parameter change (oxidation state transformation) enables the formation of uniform oxygen-depleted regions without requiring complex structural modifications to the overall memory cell design.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for the consistent formation of memory cells with tailored oxygen-depleted regions, enhancing the uniformity and efficiency of memory cell production across multiple cells, overcoming previous challenges in directly depositing oxygen-depleted regions.

Implementation Method 1

oxygen is transferred to form an oxygen-depleted region, subdividing the metal oxide into regions with varying oxygen concentrations

Methodology Applied
Scientific EffectOxygen transfer: Diffusion

Implementation Method 2

The first metal oxide material has at least two regions which differ in oxygen concentration relative to one another

Methodology Applied
Scientific EffectConductivity change due to oxygen concentration variation: Electrical Resistance

Data Source

PatentEP2805350B1Memory cells and methods of forming memory cells
Publication Date: 2017.02.01 MICRON TECHNOLOGY INC
  • EP2805350B1 patent drawing
  • EP2805350B1 patent drawing
  • EP2805350B1 patent drawing

AI summary

Some embodiments include memory cells which contain, in order; a first electrode material, a first metal oxide material, a second metal oxide material, and a second electrode material. The first metal oxide material has at least two regions which differ in oxygen concentration relative to one another. One of the regions is a first region and another is a second region. The first region is closer to the first electrode material than the second region, and has a greater oxygen concentration than the second region. The second metal oxide material includes a different metal than the first metal oxide material. Some embodiments include methods of forming memory cells in which oxygen is substantially irreversibly transferred from a region of a metal oxide material to an oxygen-sink material. The oxygen transfer creates a difference in oxygen concentration within one region of the metal oxide material relative to another.