MEMS Aperture Array Geometry for Multi-Beam Inspection
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Solution Overview
Problem
Multi-beam charged particle beam systems face challenges in optimizing throughput due to their complex structures, which makes it difficult to adapt to different scanning modes and applications, leading to suboptimal performance in various inspection tasks.
Innovation Solution
The implementation of a multi-beam inspection system with a microelectromechanical system (MEMS) aperture array that includes sets of apertures arranged in different two-dimensional shapes, such as hexagonal and jagged-edged rectangular patterns, allowing for operation in multiple modes by controlling the pass-or-block statuses of the apertures, enabling the system to adapt to various scanning modes and applications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a multi-beam system uses multiple electron beams to scan the surface simultaneously, then the throughput of imaging is improved, but the structural complexity increases and structural flexibility decreases
Solution Approach 1:
The aperture array is divided into multiple independently controllable aperture groups, where each group can be selectively activated or deactivated. This segmentation allows the system to use only the necessary number of beams for a given inspection task, reducing the effective complexity while maintaining the capability for high-throughput imaging when needed.
Solution Approach 2:
The system employs dynamic control of aperture groups, allowing the operational configuration to change based on inspection requirements. The controller can selectively activate different aperture groups during different scanning modes, making the system adaptable and flexible despite having multiple beams available, thus resolving the contradiction between throughput capability and operational complexity.
2Productivity
If a multi-beam system uses multiple electron beams to scan the surface simultaneously, then the throughput of imaging is improved, but the adaptability to different scanning modes decreases
Solution Approach 1:
The system dynamically reconfigures which aperture groups are active based on the scanning mode and inspection requirements. The controller selectively activates different aperture groups for different scanning modes (e.g., continuous scan vs. leap-and-scan), enabling high adaptability while maintaining the throughput benefits of multi-beam operation when appropriate.
Solution Approach 2:
The aperture array is designed with multiple aperture groups that can serve different scanning modes and inspection tasks. Each aperture group can be independently controlled to optimize performance for specific applications, making the system universally adaptable to various scanning modes while preserving high-throughput capabilities across different operational contexts.
3Manufacturing precision
If the aperture array uses a fixed geometric pattern, then the manufacturing precision is improved, but the adaptability to different inspection tasks decreases
Solution Approach 1:
The aperture array is segmented into multiple aperture groups with different geometric patterns, where each group is precisely manufactured for specific inspection tasks. The controller selects and activates the appropriate pre-manufactured pattern group based on the inspection task, maintaining high manufacturing precision for each pattern while achieving adaptability through selective activation.
Solution Approach 2:
The system dynamically selects which aperture group pattern to activate based on inspection task requirements. While each individual pattern group maintains fixed, precisely manufactured geometry, the overall system achieves adaptability by switching between different pre-manufactured pattern configurations, thus resolving the contradiction between manufacturing precision and task adaptability.
Data Source
AI summary
Apparatuses, systems, and methods for beam array geometry optimization of a multi-beam inspection tool are disclosed. In some embodiments, a microelectromechanical system (MEMS) may include a first row of apertures; a second row of apertures positioned below the first row of apertures; a third row of apertures positioned below the second row of apertures; and a fourth row of apertures positioned below the third row of apertures; wherein the first, second, third, and fourth rows are parallel to each other in a first direction; the first and third rows are offset from the second and fourth rows in a second direction that is perpendicular to the first direction; the first and third rows have a first length; the second and fourth rows have a second length; and the first length is longer than the second length in the second direction.