MEMS Mirror Shielding Plate for Accurate Tilt Angle Sensing

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Solution Overview

Problem

The use of MEMS mirrors in EUV lithography apparatuses is hindered by temporally and spatially varying current flows due to electron emission from mirror surfaces, which disturb the monitoring of tilt angles and affect the precision of micromirror positioning.

Innovation Solution

Incorporating an electrically conductive shielding plate under the mirror plate to reduce capacitive coupling between the mirror plate and the capacitive sensor, along with dedicated grounding to manage electron discharge, thereby improving the precision of tilt angle detection and control.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a capacitive sensor with electrodes is used to detect the tilt angle of the mirror plate, then the tilt angle can be monitored, but electron-induced current flows disturb the measurement precision

Engineering Contradiction:
Improvetilt angle detection precisionVSAvoidelectron-induced current flow disturbance
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

A capacitive sensor with multiple electrodes is introduced as an intermediary measurement device to detect the tilt angle of the mirror plate without direct electrical contact. The sensor measures changes in capacitance caused by mirror displacement, thereby avoiding direct interference from electron-induced currents while still enabling precise tilt angle monitoring

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The harmful electron-induced current flows are extracted and separated from the measurement circuit by using the capacitive sensor's electrodes as distinct measurement points. The current disturbances are isolated to specific regions while the capacitance measurement remains unaffected, allowing accurate tilt detection despite the presence of electron currents

Inventive Principle:
Principle #2Taking out (Extraction)

2Manufacturing precision

If the mirror plate is made manipulable in six degrees of freedom for precise positioning, then positioning accuracy is improved, but device complexity increases

Engineering Contradiction:
Improvemicromirror positioning accuracyVSAvoidactuator and sensor system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

Multiple actuators for controlling six degrees of freedom are integrated into a unified MEMS structure where the mirror plate, carrier plate, and actuators form a single manufactured component. This merging reduces assembly complexity while maintaining the capability for precise six-degree-of-freedom positioning

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

A capacitive sensor system with multiple electrodes provides real-time feedback on the mirror plate's position and tilt angle. This feedback enables closed-loop control of the six actuators, allowing the system to achieve and maintain precise positioning despite the increased complexity of having multiple degrees of freedom

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances the precision of micromirror positioning by minimizing disturbances from electron-induced current flows, allowing for more accurate control of MEMS mirrors in EUV lithography systems.

Implementation Method 1

a capacitive sensor having a number of electrodes for detecting the tilt angle of the mirror plate

Methodology Applied
Scientific EffectCapacitance: Capacitance

Implementation Method 2

an electrically conductive shielding plate is arranged under the mirror plate in order to reduce a capacitive coupling between the mirror plate and the electrodes of the capacitive sensor

Methodology Applied
Scientific EffectCapacitive coupling: Capacitance

Implementation Method 3

radiation (also referred to as operating light, for example EUV light) is incident on the surface of the micromirror and is reflected there

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 4

The photons from the EUV radiation source in the lithography apparatus may trigger the emission of electrons from the mirror surfaces of the MEMS mirrors as a result of the photoelectric effect

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Data Source

PatentUS20260079336A1MEMS mirror, micromirror array and illumination system for a lithography system, lithography system, and method for producing a lithography system
Publication Date: 2026.03.19 CARL ZEISS SMT GMBH
  • US20260079336A1 patent drawing
  • US20260079336A1 patent drawing
  • US20260079336A1 patent drawing

AI summary

A MEMS mirror for a lithography system, comprising: a mirror plate which can be displaced about a tilt angle; a carrier plate for carrying the mirror plate; a base plate; a solid-body joint, coupling the base plate and the carrier plate, for tilting the mirror plate; and a capacitive sensor having a number of electrodes for detecting the tilt angle of the mirror plate. An electrically conductive shield plate for reducing a capacitive coupling between the mirror plate and the electrodes of the capacitive sensor is arranged under the mirror plate.