Meniscus Coating Nozzle Supply Adjustment for Film Uniformity

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Solution Overview

Problem

Existing meniscus coating methods struggle to achieve uniform thickness in the formation of extremely thin layers for organic thin-film solar cells and organic/inorganic hybrid solar cells, due to variations in coating liquid ejection amounts between nozzles.

Innovation Solution

A coating device with a coating liquid supply amount adjustment member upstream of each nozzle, combined with nozzle position adjustment members to ensure precise alignment and contact between nozzles and the coating bar, allowing for uniform coating liquid distribution and reduced variation in film thickness.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If a meniscus coating method with multiple nozzles is used to form extremely thin layers over large areas, then the coating area and efficiency are improved, but the uniformity of film thickness deteriorates due to variations in coating liquid ejection amounts between nozzles

Engineering Contradiction:
Improvecoating areaVSAvoidfilm thickness uniformity
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The patent applies local quality by providing individual coating liquid supply amount adjustment members for each nozzle, allowing independent control and optimization of coating liquid ejection amounts at each local position. This ensures uniform coating liquid supply across all nozzles, thereby achieving uniform film thickness over large coating areas while maintaining the efficiency benefits of multiple nozzles

Inventive Principle:
Principle #3Local quality

2Device complexity

If coating liquid supply amount is not precisely controlled at each nozzle, then the device complexity and operation simplicity are maintained, but the coating film uniformity deteriorates

Engineering Contradiction:
Improvedevice structure simplicityVSAvoidcoating liquid supply uniformity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent applies parameter changes by introducing adjustment members that enable precise control of coating liquid supply parameters (flow rate, pressure, or volume) for each nozzle independently. This allows optimization of ejection amounts to achieve uniform coating liquid supply across all nozzles, improving coating film uniformity while maintaining relative simplicity through straightforward adjustment mechanisms

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables the formation of uniform and high-quality coating films over large areas, improving the consistency and efficiency of the meniscus coating method for solar cell applications.

Implementation Method 1

a meniscus coating method is known as one of roll-to-roll (R2R) coating methods capable of forming an extremely thin layer over a large area at low cost

Methodology Applied
Scientific EffectMeniscus: Surface Tension

Implementation Method 2

a method of supplying a liquid to a coating bar head from a plurality of nozzles to obtain a single large-area coating film

Methodology Applied
Scientific EffectCapillary action: Capillary Action

Data Source

PatentUS20250178015A1Coating device and coating method
Publication Date: 2025.06.05 KK TOSHIBA
  • US20250178015A1 patent drawing
  • US20250178015A1 patent drawing

AI summary

According to an embodiment, there are provided a coating device and a coating method for forming a coating film by a meniscus method, the coating device and the coating method being capable of forming a uniform coating film. The coating device includes:a coating bar;a base material conveyance member that conveys a base material;a plurality of nozzles that supply the coating liquid to a surface of the coating bar; anda coating liquid supply member that supplies the coating liquid to the nozzles,in which a coating liquid supply amount adjustment member that adjusts a supply amount of the coating liquid to be supplied to the nozzles is provided at a position upstream of each of the nozzles.