Mesa Imprint Template with Light Blocking Layer for Nanoimprint Lithography
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Solution Overview
Problem
In nanoimprint lithography, the existing techniques face challenges in accurately and efficiently transferring fine patterns onto wafers due to over-extrusion phenomena, which lead to non-uniform thickness of the imprint medium layer and contamination of the imprint template, resulting in poor pattern accuracy and reduced process yield.
Innovation Solution
An imprinting apparatus and method that utilize a mesa-structured imprint template with a light blocking layer to define a window region, where a first exposure light forms an extrusion barrier in the boundary region and a second exposure light cures the imprint region, preventing excessive extrusion and ensuring uniform thickness, while a mirror device adjusts the light beam to precisely target the patterned surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the imprint template is pressed toward the imprint medium layer to transfer patterns, then pattern transfer efficiency is improved, but over-extrusion phenomenon occurs causing non-uniform thickness and contamination
Solution Approach 1:
The imprint template is segmented into a patterned surface region and a light blocking layer region, where the light blocking layer is spaced apart from the patterned surface to define a window region. This segmentation allows selective exposure: the window region receives first exposure light to form an extrusion barrier in the boundary region, while the patterned surface receives second exposure light for curing. This prevents over-extrusion of the imprint medium layer while maintaining efficient pattern transfer.
Solution Approach 2:
The first exposure light is irradiated onto the window region before the imprint template is pressed toward the imprint medium layer, forming an extrusion barrier in the boundary region in advance. This preliminary action prevents over-extrusion during the subsequent pressing operation, ensuring uniform thickness of the imprint medium layer while allowing efficient pattern transfer.
2Productivity
If the imprint template is pressed toward the imprint medium layer to transfer patterns, then throughput is improved, but contamination of the imprint template occurs
Solution Approach 1:
The imprint template is segmented into a patterned surface region and a light blocking layer region, where the light blocking layer is spaced apart from the patterned surface to define a window region. This segmentation allows selective exposure: the window region receives first exposure light to form an extrusion barrier in the boundary region, while the patterned surface receives second exposure light for curing. This prevents over-extrusion of the imprint medium layer which causes contamination, thereby maintaining high process yield while preserving throughput.
3Manufacturing precision
If the light blocking layer is spaced apart from the patterned surface to define a window region, then extrusion barrier formation is improved, but device complexity increases
Solution Approach 1:
The imprint template is segmented into a patterned surface region and a light blocking layer region, where the light blocking layer is spaced apart from the patterned surface to define a window region. This segmentation enables precise control of exposure regions: the window region allows first exposure light to form an extrusion barrier in the boundary region, while the patterned surface receives second exposure light for curing. Although this increases template structure complexity, it provides precise control over extrusion barrier formation.
Solution Approach 2:
The light blocking layer is positioned at specific locations outside the patterned surface region to define a window region with specific properties. This local quality approach allows the window region to selectively receive first exposure light for forming an extrusion barrier in the boundary region, while other regions receive different treatments. This localized control improves extrusion barrier formation precision.
4Measurement precision
If the mirror device is used to adjust light beam direction and size, then exposure precision is improved, but device complexity increases
Solution Approach 1:
A mirror device is introduced as an intermediary component in the exposure system to adjust the direction and size of the light beam. The mirror device enables precise control of light exposure to different regions: first exposure light is directed to the window region to form an extrusion barrier, and second exposure light is directed to the patterned surface for curing. Although this increases exposure system complexity, it provides the necessary precision for selective exposure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively prevents over-extrusion, maintains uniform thickness of the imprint medium layer, and enhances the accuracy of imprinted patterns, thereby improving the yield and precision of the nanoimprint lithography process.
Implementation Method 1
A first exposure light may be irradiated onto the window region to form an extrusion barrier in the boundary region
Implementation Method 2
A second exposure light may be irradiated onto the patterned surface to cure the imprint region
Data Source
AI summary
An imprinting apparatus and methods of forming imprinted patterns are provided. The imprinting apparatus may include an imprint template and an exposure system. The imprint template may include a mesa portion and a light blocking layer. The mesa portion may have a patterned surface providing imprinting patterns, and the light blocking layer may define a window region. The exposure system may be configured to alternately generate a first exposure light travelling toward the window region and a second exposure light travelling toward the patterned surface.