Mesa Infrared Detector Passivation for Low Leakage Current
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Solution Overview
Problem
Infrared detecting devices face challenges in achieving high signal noise ratio (SNR) characteristics due to high intrinsic carrier density and low device resistance, leading to increased leakage currents, especially in semiconductor materials with small bandgaps.
Innovation Solution
The design incorporates a semiconductor substrate with a mesa structure formed by layers of AlxIn1-xSb, where the light receiving layer contains 0.05<x<0.18, and the side surfaces are covered with a protective silicon nitride layer, enhancing device resistance and reducing recombination currents.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If semiconductor materials with small bandgaps are used for detecting infrared rays of wavelength 2 μm or more, then the detecting capability for long wavelength infrared is improved, but the intrinsic carrier density increases and device resistance decreases, leading to high leakage currents and poor PN diode characteristics
Solution Approach 1:
The invention changes the material composition parameter by using AlInSb compound semiconductor with specific aluminum composition ratio (0.05 < x < 0.18) to optimize the bandgap and carrier density, achieving both long-wavelength infrared detection capability and sufficient PN diode characteristics at room temperature
Solution Approach 2:
The invention uses composite AlInSb compound semiconductor material combining aluminum, indium, and antimony elements to create a layered structure with different bandgaps, enabling both high quantum efficiency for long-wavelength infrared and controlled electrical characteristics
2Reliability
If cooling mechanisms are added to suppress thermally excited carriers, then the leakage current is reduced and PN diode characteristics improve, but the device complexity and size increase
Solution Approach 1:
The invention converts the harmful thermal excitation effect into a beneficial feature by designing the AlInSb bandgap structure such that the narrow bandgap enables room-temperature operation while the specific material composition suppresses thermal carrier generation, eliminating the need for cooling mechanisms
3Reliability
If the aluminum composition ratio in the light receiving layer is increased to improve device resistance, then the leakage current decreases, but the quantum efficiency and photocurrent generation capability are reduced
Solution Approach 1:
The invention optimizes the aluminum composition ratio parameter within the specific range (0.05 < x < 0.18) to achieve the best balance between device resistance and quantum efficiency, where the lower bound ensures sufficient photocurrent while the upper bound maintains adequate device resistance
Solution Approach 2:
The invention uses a small but precise amount of aluminum composition (not zero, but limited to specific range) to achieve the necessary device resistance improvement without excessively compromising the quantum efficiency, finding the optimal partial concentration
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration improves the signal noise ratio (SNR) of infrared detecting devices by increasing device resistance without lowering photocurrent, thereby enhancing the overall performance.
Implementation Method 1
electrons and holes generated by the absorbed infrared rays in a light receiving layer
Implementation Method 2
the side surfaces are covered with a protective silicon nitride layer, enhancing device resistance and reducing recombination currents
Data Source
AI summary
An infrared detecting device is provided. The infrared detecting device includes: a semiconductor substrate; a first layer having a first conductivity type on the semiconductor substrate; a light receiving layer on the first layer; and a second layer having a second conductivity type on the light receiving layer. A part of the first layer, the light receiving layer, and the second layer form a mesa structure. The second layer contains AlzIn1-zSb (0.05<z<0.18). The side surfaces and an upper surface of the mesa structure are covered with the protective layer. A part of an upper surface of the second layer that forms an interface between the second layer and the protective layer has an oxide layer made of a constituent material of the second layer. The oxide layer includes an oxide of Al and has no oxide of Sb.


