Mesh-Based Data Verification for Electron Beam Writing
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Solution Overview
Problem
Existing electron beam writing apparatuses face challenges in detecting data overlap during proximity effect correction, leading to improper resist exposure and reduced throughput, as conventional verification methods fail to detect overlapping patterns effectively.
Innovation Solution
The method involves delimiting data into meshes, calculating area values and center-of-gravity positions, and performing proximity effect correction only when the center-of-gravity positions fall within predetermined ranges, thereby minimizing computational processing and detecting data overlap efficiently.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional data verification methods are used to detect overlapping patterns, then manufacturing precision is improved, but productivity deteriorates due to increased processing time
Solution Approach 1:
The patent extracts only the essential verification information (area values and center-of-gravity positions) from the complete writing data, performing verification calculations solely on these extracted parameters rather than processing all original data, thereby reducing computation time while maintaining detection accuracy
Solution Approach 2:
The patent segments the writing data into discrete meshes, calculating area values and center-of-gravity positions for each mesh independently. This segmentation allows for efficient parallel processing and reduces the overall computational burden compared to analyzing the complete dataset as a whole
2Manufacturing precision
If comprehensive data verification is performed to ensure proper resist exposure, then manufacturing precision is improved, but loss of time increases due to repeated area and center-of-gravity calculations
Solution Approach 1:
The patent performs preliminary calculations of area values and center-of-gravity positions during the data preparation phase, storing these calculated parameters for later verification use. This preliminary action eliminates the need to recalculate these values during the verification process itself, significantly reducing verification time while ensuring accurate resist exposure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces processing time and effectively detects data overlap, ensuring proper resist exposure and minimizing throughput reduction during electron beam writing.
Implementation Method 1
a writing apparatus using a charged particle beam
Implementation Method 2
the influence of backward scattering of an electron beam becomes large
Data Source
AI summary
Data including information related to each area with a graphic disposed therein is inputted to the writing apparatus. The area is delimited with meshes each having a predetermined size. Next, an area value of a graphic lying within each of the meshes and its center-of-gravity position are determined. For every mesh, a check is made whether the area value is less than or equal to a predetermined value. When the area value is less than or equal to the predetermined value, a range allowable for an x coordinate of the center-of-gravity position is determined and a check is made whether an actual x coordinate falls within this range. Next, a range allowable for a y coordinate of the center-of-gravity position is determined and a check is made whether an actual y coordinate falls within this range.