Metal Etching Chemical Composition for Uniform Dissolving Amount
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Solution Overview
Problem
In semiconductor device manufacturing, existing chemical liquids used for etching or washing fail to maintain a consistent dissolving amount of metal-containing substances across multiple sites, leading to variations in treatment efficiency.
Innovation Solution
A chemical liquid comprising water, hydroxylamine compounds, and specific compounds represented by Formula (1), with controlled mass ratios and concentrations, is applied to objects containing metals like cobalt, ruthenium, molybdenum, aluminum, or copper, to achieve a small variation in dissolving amount and improve surface smoothness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing chemical liquids are used for etching metal-containing substances, then the etching process can be performed, but the variation in dissolving amount across multiple sites is large
Solution Approach 1:
The patent modifies the chemical composition parameters of the etching liquid by incorporating specific compounds (Formula 1) with controlled concentrations (0.1 ppm to 10% by mass) alongside hydroxylamine compounds. This parameter adjustment optimizes the etching characteristics to reduce variation in dissolving amount across different sites while maintaining reliable and consistent treatment results.
2Productivity
If chemical liquid concentration is increased to improve etching efficiency, then productivity increases, but variation in dissolving amount also increases
Solution Approach 1:
The patent creates a composite chemical liquid system combining hydroxylamine compounds with specific compounds of Formula (1) in defined concentration ratios. This composite formulation achieves high etching efficiency through synergistic effects while maintaining low variation in dissolving amount, as the combined chemistry provides both reactivity and uniformity across multiple treatment sites.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The chemical liquid effectively reduces variation in the dissolving amount of metal-containing substances and enhances the smoothness of metal surfaces, improving the consistency and efficiency of the treatment process.
Implementation Method 1
a hydroxylamine compound selected from the group consisting of hydroxylamine and a hydroxylamine salt
Data Source
AI summary
The present invention provides a chemical liquid that causes a small variation in a dissolving amount of a first metal-containing substance in a case where the chemical liquid is applied to an object to be treated containing the first metal-containing substance. The present invention also provides a method for treating an object to be treated. The chemical liquid according to an embodiment of the present invention contains water, a hydroxylamine compound selected from the group consisting of hydroxylamine and a hydroxylamine salt, and a specific compound represented by Formula (1).