Metal Light-Blocking Element With Nanostructure Anti-Reflection

The patent applies local quality by creating a nano-ridged convex structure layer with varying ridge heights (first ridges with height H1, second ridges with height H2 where H1 > H2) and different materials (light absorbing material in valleys, dielectric material on ridges) at different locations on the light blocking element surface. This localized structural and material differentiation optimizes light absorption at specific areas while maintaining overall light blocking efficiency.

The patent employs composite materials by combining light absorbing material (such as carbon black) with dielectric material (such as silicon oxide, silicon nitride, or titanium oxide) in a layered nanostructure. The light absorbing material fills the valleys between ridges while the dielectric material coats the ridges, creating a composite structure that enhances both light absorption and reflection reduction through material property synergy.

The patent transitions from a two-dimensional flat surface to a three-dimensional nano-ridged convex structure by forming ridges with specific heights and spacing. This dimensional transformation creates multiple light interaction paths (reflection, absorption, multiple internal reflections) that enhance light absorption efficiency while the self-organized ridge pattern helps manage structural complexity through geometric repetition.

The patent utilizes parameter changes by controlling the ridge height (H1, H2), ridge spacing (S1, S2), and material layer thicknesses to optimize light absorption across different wavelengths. The specific parameter relationships (H1 > H2, S1 > S2) create a gradient structure that progressively enhances light trapping while maintaining manufacturability through controlled deposition processes.