Metal Mask Surface Grooves for High-Resolution Opening Etching
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional metal masks used in display panel manufacturing face challenges in achieving high resolution due to reduced pitch between openings, leading to incomplete photoresist coverage and the formation of large or interconnected openings during etching.
Innovation Solution
A metal mask manufacturing method involving calendering to create a substrate with grooves and openings, where the average area ratio of grooves to sampling regions is controlled between 45% and 68%, ensuring suitable roughness for effective photolithography and formation of eligible openings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the pitch among openings is reduced to achieve high resolution, then the resolution is improved, but the photoresist coverage becomes incomplete leading to ineligible openings
Solution Approach 1:
The patent applies preliminary action by forming grooves on the metal mask substrate before photolithography. These pre-formed grooves create a roughened surface that enables the photoresist to properly adhere and cover the area between adjacent openings, preventing etching defects before they occur. The grooves are created through calendering with a roller having protrusions, establishing the necessary surface topology in advance of the patterning process.
2Ease of manufacture
If conventional photolithography is used on smooth metal mask substrate, then the process is simple, but the photoresist cannot completely cover the area between openings resulting in large or interconnected openings
Solution Approach 1:
The patent applies local quality by creating grooves only in specific regions of the metal mask substrate where openings will be formed. The grooves are localized to the areas between adjacent openings, providing enhanced photoresist adhesion precisely where needed. This localized modification maintains process simplicity while ensuring proper photoresist coverage and preventing etching defects in critical regions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method ensures suitable roughness for the metal mask substrate, allowing for complete photoresist coverage and preventing ineligible openings, thereby enabling the production of high-resolution display panels.
Implementation Method 1
a metal material is calendered, so as to form a metal mask substrate, in which the metal mask substrate includes a surface and a plurality of grooves formed in the surface
Implementation Method 2
a conventional metal mask is usually manufactured by photolithography, so that the openings are defined by a photoresist pattern after developing
Data Source
AI summary
A method of manufacturing a metal mask includes calendering a metal material, so as to form a metal mask substrate, where the metal mask substrate includes a surface and a plurality of grooves formed in the surface, and the grooves all extend in a direction. The surface has at least one sampling region, while at least two grooves are distributed in the sampling region, where an average area ratio of the area of the grooves within the sampling region to the area of the sampling region ranges between 45% and 68%.