Mixed Metal-Oxygen Cluster Resist for Sub-15 nm Patterning
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Solution Overview
Problem
Current patterning technologies face challenges with low light source transmission efficiency and high exposure energy requirements, especially when using wavelengths below 15 nm, which limits the resolution and edge roughness of patterns in semiconductor devices.
Innovation Solution
An organic mixed metal-oxygen cluster compound is developed, with specific metal and ligand compositions that enhance sensitivity and resolution, allowing for high-resolution pattern formation with low edge roughness and reduced exposure energy, using soft X-rays or electron beams.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If organic polymer material system is used for patterning, then traditional processing is maintained, but resolution deteriorates when wavelength is reduced below 15 nm
Solution Approach 1:
The patent employs organic silicon material as a composite patterning material that combines the processing advantages of traditional organic polymers with the high-resolution capabilities needed for sub-15 nm wavelengths. This composite material system maintains compatibility with existing patterning workflows while achieving the required resolution improvement.
2Manufacturing precision
If organic silicon material system is used to achieve high resolution, then pattern resolution is improved, but exposure energy requirement increases to extremely high levels
Solution Approach 1:
The patent modifies the chemical composition and molecular structure parameters of the organic silicon material to optimize its photosensitivity. By adjusting these material parameters, the exposure energy requirement is reduced from extremely high levels to manageable ranges while maintaining the high resolution capability.
3Use of energy by moving object
If patterning material sensitivity is increased for sub-15 nm wavelengths, then exposure energy is reduced, but light source transmission efficiency remains low
Solution Approach 1:
The patent transitions from relying on light source transmission efficiency to using material-based sensitivity enhancement. By substituting the approach from optical system optimization to material chemistry optimization, the system achieves high sensitivity patterning with reduced exposure energy despite inherent limitations in light source transmission at sub-15 nm wavelengths.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The organic mixed metal-oxygen cluster compound achieves high sensitivity and improved resolution down to 10 nm to 40 nm with low edge roughness and reduced exposure energy, addressing the limitations of existing patterning materials.
Implementation Method 1
under exposure of soft X-rays whose wavelengths range from 1 nm to 15 nm, the organic mixed metal-oxygen cluster compound has high sensitivity
Data Source
AI summary
This application provides an organic mixed metal-oxygen cluster compound, and a chemical general formula thereof is as follows: (M1)a(M2)b(M3)cOg(L1)x(L2)y(L3)z, where M1 is selected from at least one of Ti, Zr, and Hf; M2 is selected from at least one of Bi, Te, Sn, Pt, Ag, and Au; M3 is selected from one of Fe, Ni, Co, and Cu; L1, L2, and L3 are respectively selected from organic ligands that directly coordinate with a metal and include one of O, S, Se, N, and P that serves as a ligating atom; a, b, g, x, y, and z are all natural numbers greater than or equal to 1; and c is a natural number greater than or equal to 0. This application further provides a patterning material including the organic mixed metal-oxygen cluster compound, a semiconductor device including the patterning material, a terminal, and a substrate surface patterning method.