Metal-Silicon Mask Structure Resisting Gravity Droop
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Solution Overview
Problem
The distance change between masks and target process objects due to gravity droop affects the precision of graphic structures in display panel preparation, particularly in silicon material masks that lack magnetic attraction, leading to uneven attachment and reduced product quality.
Innovation Solution
A mask design incorporating a metal layer in the first shield structure for magnetic attraction and a silicon-containing material layer in the second shield structure, with a concave-convex sidewall structure to resist gravity droop, ensuring precise attachment and improved resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a silicon material mask is used, then the mask can be attached to the target process object, but the mask cannot resist gravity droop due to lack of magnetic attraction, causing distance changes and reducing graphic structure precision
Solution Approach 1:
The mask combines silicon material and magnetic material to form a composite structure. The silicon material provides attachment capability to the target process object, while the magnetic material layer provides magnetic attraction to resist gravity droop. This composite material approach resolves the contradiction by integrating the advantages of both materials.
Solution Approach 2:
The magnetic material is selectively applied as a thin layer on specific regions of the silicon mask where magnetic attraction is needed. This local quality approach allows the mask to maintain its primary silicon material properties while adding magnetic functionality only where required to counteract gravity droop.
2Manufacturing precision
If the mask is made thinner to improve resolution, then the graphic structure precision improves, but the mask becomes more susceptible to gravity droop, reducing attachment uniformity
Solution Approach 1:
By using composite materials with the magnetic material layer on the silicon mask, the mask achieves both thinness for high resolution and sufficient magnetic attraction for stability. The magnetic layer provides the necessary force to counteract gravity even in thinner mask structures.
Solution Approach 2:
The invention changes the physical parameters of the mask by adding a magnetic material layer with specific thickness and magnetic properties. This parameter change enables the mask to maintain stability through magnetic attraction while keeping the overall structure thin enough for high-resolution graphic structures.
3Reliability
If a metal layer is added to provide magnetic attraction, then the mask can resist gravity droop, but the device complexity increases
Solution Approach 1:
The magnetic material is applied as a thin layer only on the necessary regions of the silicon mask, rather than making the entire mask complex. This local quality approach adds minimal structural complexity while providing the required magnetic attraction functionality.
Solution Approach 2:
The invention replaces mechanical attachment methods with magnetic attraction. Instead of relying solely on mechanical clamping or support structures to prevent gravity droop, the magnetic field provides a non-contact force that simplifies the overall system while improving reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The mask design enhances the precision of graphic structures on display panels by resisting gravity droop through magnetic attraction, improving the uniformity and stability of the mask-target object attachment, thereby increasing the resolution and quality of the prepared patterns.
Implementation Method 1
a first shield structure and a plurality of hollows, an orthographic projection of the first shield structure in the first region surrounding an orthographic projection of the hollows in the first region, and the first shield structure being configured to form a mask pattern; and a second region surrounding the first region, the second region comprising a second shield structure; wherein, a side surface of the first shield structure in a thickness direction comprises at least one first convex part and at least one first concave part
Data Source
AI summary
A mask and a preparation method thereof are provided. The mask comprises: a first region (100) comprising a first shield structure (110) and a plurality of hollows (120), an orthographic projection of the first shield structure (110) in the first region (100) surrounding an orthographic projection of the hollows (120) in the first region (100), the first shield structure (110) being configured to form a mask pattern; and a second region (200) surrounding the first region (100), the second region (200) comprising a second shield structure (210); wherein a side surface of the first shielding structure (110) in a thickness direction comprises at least one first convex part (a1) and at least one first concave part (b1), the first convex part (a1) are connected with the first concave part (b1); the first shielding structure (110) comprises a metal layer and the second shielding structure (210) comprises a silicon-containing material layer.