Interconnection Die Packaging Between Metallization Portions
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Solution Overview
Problem
There is a need for packages with improved performance and reduced size that incorporate metallization portions and integrated devices, while maintaining high-density interconnects and aspect ratios.
Innovation Solution
The package design includes a first metallization portion with dielectric layers and interconnects, an interconnection die, and a second metallization portion with dielectric layers and interconnects, where the interconnection die is used to couple the first and second metallization portions, and an encapsulation layer is placed between them, allowing for high-density interconnects and a compact form factor.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If an interconnection die is used to couple metallization portions, then high-density interconnects with high aspect ratios are achieved, but the device complexity increases
Solution Approach 1:
The package is divided into separate metallization portions (first and second) that are coupled through an interconnection die, allowing independent optimization of each metallization layer while achieving high interconnect density through the interposer structure
Solution Approach 2:
An interconnection die (interposer) is introduced as an intermediary component between the first and second metallization portions, enabling high-aspect-ratio interconnects to pass through the encapsulation layer and providing a mediator that facilitates electrical coupling while maintaining package compactness
2Volume of moving object
If an encapsulation layer is placed between metallization portions, then the form factor is reduced, but the manufacturing complexity increases
Solution Approach 1:
The encapsulation layer is positioned in the vertical dimension between metallization portions, allowing horizontal integration of multiple metallization layers while maintaining a thin vertical profile, thus reducing overall package volume without requiring lateral expansion
Solution Approach 2:
The encapsulation layer is formed as part of the preliminary packaging process before final assembly, integrating the protective and spacing functions into the base package structure rather than adding them as separate subsequent steps
Data Source
AI summary
A package comprising a first metallization portion, a first integrated device, an interconnection die, a second metallization portion, and an encapsulation layer. The first metallization portion includes at least one first dielectric layer and a first plurality of metallization interconnects. The first integrated device is coupled to the first metallization portion. The interconnection die is coupled to the first metallization portion. The second metallization portion coupled to the first metallization portion through the interconnection die such that the first integrated device and the interconnection die are located between the first metallization portion and the second metallization portion. The second metallization portion includes at least one second dielectric layer and a second plurality of metallization interconnects. The encapsulation layer coupled to the first metallization portion and the second metallization portion, wherein the encapsulation layer is located between the first metallization portion and the second metallization portion.


