Metrology Data Estimation Using Matrix Completion
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Solution Overview
Problem
The development of libraries for metrology in lithographic processes is time-consuming due to the simulation of optical responses, which increases the 'Time to Recipe' (T2R) and measurement simulation time, making existing methods inefficient for estimating data such as optical responses.
Innovation Solution
An apparatus and method using a processor to estimate unknown values of data sets indicative of radiation diffracted, reflected, or scattered by features on a substrate, based on known values, smoothness conditions, and correlation conditions, employing a matrix completion algorithm with convex optimization techniques to generate libraries comparable to measured data.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If simulation of optical responses is used to develop metrology libraries, then measurement precision is improved, but time consumption increases
Solution Approach 1:
The patent pre-calculates and stores optical responses for various feature parameters in a library before actual metrology measurements are performed. This preliminary simulation work is done offline, allowing rapid comparison with measured data during production without time-consuming real-time simulations, thus resolving the contradiction between measurement precision and time consumption
Solution Approach 2:
The patent creates a library of pre-simulated optical responses that serve as reference copies for comparison with actual measurements. Instead of simulating from scratch during measurement, the system uses these pre-prepared copies, significantly reducing measurement time while maintaining precision through accurate reference data
2Measurement precision
If full simulation of optical responses is performed, then data accuracy is improved, but computational effort increases
Solution Approach 1:
The patent segments the computational task by dividing the parameter space into discrete values (e.g., CD values, sidewall angles, line widths) and pre-calculating optical responses for each segment. This allows the complex simulation to be performed once for each parameter combination and stored, rather than recalculating fully for every measurement, improving both accuracy and computational efficiency
Solution Approach 2:
The patent performs comprehensive optical response simulations in advance for all expected parameter combinations and stores these results in a library. This preliminary computational effort is made once during library generation, enabling rapid and accurate measurements later without repeating the full computational burden, thus resolving the contradiction between data accuracy and computational efficiency
Data Source
AI summary
Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data including a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more features fabricated in or on a substrate, wherein the plurality of sets of data include at least one known value, and wherein at least one of the plurality of sets of data includes an unknown value, the apparatus including a processor to estimate the unknown value of the at least one set of data based on: the known values of the plurality of sets of data, a first condition between two or more values within a set of data of the plurality of sets of data, and a second condition between two or more values being part of different sets of data of the plurality of the sets of data.


