Metrology Mapping Design to Image Data for Submicron Precision
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Solution Overview
Problem
Current metrology processes in semiconductor fabrication face challenges in achieving high precision and uniformity due to the need for frequent and detailed inspections of submicron features, which are not adequately addressed by existing methods for defining and performing metrology operations.
Innovation Solution
A method and system that utilize a processor to perform metrology operations by mapping between design-based and image-based representations of semiconductor specimens, allowing for the definition and execution of metrology operations based on design data, including structural and virtual objects, and providing position calibration to ensure accurate measurements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If frequent and detailed inspections are performed to monitor submicron features, then manufacturing precision is improved, but device complexity and time consumption increase
Solution Approach 1:
The patent creates a virtual copy of the specimen represented by design data, which contains metrology object definitions and can be searched and measured without physically inspecting the actual specimen. This virtual representation allows repeated measurements and analyses without increasing physical inspection complexity or time.
Solution Approach 2:
The patent segments the metrology operation by separating the search operation (performed on design data) from the measurement operation (performed on image data). This segmentation allows the complex metrology process to be broken down into manageable stages, reducing overall complexity while maintaining precision.
2Measurement precision
If metrology operations are defined based on design data, then measurement precision is improved, but the difficulty of detecting and measuring increases
Solution Approach 1:
The patent introduces an intermediary mapping process that connects design-based representations with image-based representations. This mapping acts as a mediator, allowing metrology operations defined on design data to be accurately performed on image data, thus maintaining precision while reducing the difficulty of operation.
Solution Approach 2:
The patent replaces manual or complex mechanical measurement processes with automated computational operations. By defining metrology objects and operations through design data and using processor-based search and measurement functions, the system eliminates complex manual measurement procedures while maintaining high precision.
3Adaptability or versatility
If design-based representations are mapped to image-based representations, then adaptability of metrology operations is improved, but device complexity increases
Solution Approach 1:
The patent creates a universal mapping framework that can handle different types of metrology objects and operations across various specimens. The same mapping mechanism works for different metrology objects, making the system versatile and adaptable without requiring separate complex systems for each measurement type.
Data Source
AI summary
One or more metrology objects and one or more metrology operations may be identified. A design-based representation of a first metrology object of the one or more metrology objects may be received. Furthermore, an image-based representation of the first metrology object of the one or more metrology objects may be received where the one or more metrology operations include a first metrology operation associated with the first metrology object that is to be performed on the image-based representation of the first metrology object. The design-based representation of the first metrology object may be mapped with the image-based representation of the first metrology object. The first metrology operation may be performed based on the mapping.