Semiconductor Metrology Mapping Design Data to Images
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Solution Overview
Problem
Current semiconductor metrology processes face challenges in achieving high precision and uniformity due to the need for frequent and detailed inspections of submicron features, which requires improved utilization of design data and more efficient metrology operations.
Innovation Solution
A computer-based examination system that generates examination recipes specifying metrology objects and operations with reference to design data, allowing for image-based and design-based representations to be mapped and processed, enabling precise metrology operations on semiconductor specimens.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If frequent and detailed inspections are performed to monitor fabrication process, then manufacturing precision is improved, but productivity deteriorates
Solution Approach 1:
The system performs preliminary actions by using design data to pre-identify and mark metrology objects before actual inspection. The design-based representation of the specimen is processed to extract metrology object information, which is then used to guide the physical inspection process, reducing the need for exhaustive manual inspection while maintaining precision.
Solution Approach 2:
The patent creates a digital copy (image-based representation) of the physical specimen through scanning or imaging. This digital copy is then processed to identify and measure metrology objects, allowing virtual inspection that reduces the frequency and detail level of physical inspections while maintaining measurement accuracy.
2Measurement precision
If design data is utilized for metrology operations, then measurement precision is improved, but device complexity increases
Solution Approach 1:
The system introduces an intermediary processing layer that bridges design data and physical inspection. A computer-based system processes design data to generate a design-based representation, which is then mapped to the image-based representation during inspection. This intermediary layer simplifies the overall process by automating the correlation between design and physical measurements.
Solution Approach 2:
The patent segments the metrology process into distinct components: design data processing, image acquisition, and measurement operations. By separating these functions and using a recipe unit to coordinate them, the system manages complexity through modular organization while improving precision through integrated design-data-driven measurements.
3Manufacturing precision
If multiple metrology operations are performed on the same specimen, then manufacturing precision is improved, but loss of time increases
Solution Approach 1:
The system merges multiple metrology operations into a single coordinated process guided by a recipe unit. The recipe unit receives design data, identifies all required metrology objects and operations, and sequences them efficiently. This consolidation allows multiple measurements to be performed in an optimized sequence rather than as separate time-consuming operations.
Solution Approach 2:
The patent implements continuous processing where design data is continuously referenced during the inspection process. The system maintains continuous correlation between the design-based representation and image-based representation, allowing metrology operations to proceed without interruption or repeated setup, thereby reducing time loss while maintaining precision.
Data Source
AI summary
There are provided system and method of performing metrology operations related to a specimen. The method comprises: generating an examination recipe in accordance with a metrology application, the examination recipe specifying one or more metrology objects and one or more metrology operations related to the metrology application; obtaining an image-based representation of the specimen and a design-based representation of the specimen; mapping between the design-based representation of at least first metrology object and the image-based representation of at least first metrology object; and performing at least first metrology operation of the one or more metrology operations according to the examination recipe using the mapping, the at least first metrology operation specified as related to the at least first metrology object and to be performed on at least the image-based representation of the specimen.