Metrology Target Simulation for Lithography Precision
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Solution Overview
Problem
Current lithographic apparatuses face challenges in accurately measuring and controlling radiation distribution for precise pattern transfer onto substrates, leading to inconsistencies in device manufacturing processes.
Innovation Solution
A method involving simulation and data-driven approaches to evaluate and identify optimal metrology targets and recipes, using measurement data to tune parameters and verify process conditions, thereby improving the accuracy and efficiency of the lithographic process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If simulation and data-driven approaches are used to evaluate metrology targets and recipes, then measurement precision is improved, but device complexity increases
Solution Approach 1:
The patent performs simulations to evaluate multiple metrology targets and recipes before actual manufacturing, identifying optimal combinations in advance. This preliminary evaluation using computational models allows the system to select the best measurement approaches beforehand, improving measurement precision while managing complexity through advance planning rather than real-time complex processing
Solution Approach 2:
The patent creates virtual copies of metrology targets and measurement processes through simulation models. These digital twins allow evaluation and optimization of measurement approaches without requiring physical implementation of all possible target designs, reducing the complexity of managing multiple physical metrology configurations while maintaining measurement precision
2Manufacturing precision
If multiple metrology targets and recipes are evaluated through simulation, then manufacturing precision is improved, but loss of time increases
Solution Approach 1:
The patent performs comprehensive simulation and evaluation of multiple metrology targets and recipes during the setup phase before actual manufacturing begins. By identifying optimal measurement approaches in advance through computational modeling, the system establishes precise measurement protocols that will be used throughout production, improving manufacturing precision while minimizing time loss during ongoing manufacturing operations
Solution Approach 2:
The patent evaluates a plurality (excessive number) of metrology targets and recipes through simulation to ensure optimal selection. This comprehensive evaluation approach guarantees finding the best measurement configuration for high manufacturing precision, while the simulation-based method is more efficient than physical testing of all options, balancing thoroughness with time efficiency
Data Source
AI summary
A method of displaying a plurality of graphical user interface elements, each graphical user interface element representing a step in a measurement design, setup and/or monitoring process and each graphical user interface element enabling access by the user to further steps in the measurement design, setup and/or monitoring process for the associated step of the graphical user interface element, and displaying an indicator associated with one or more of the plurality of graphical user elements, the indicator indicating that a step in the measurement design, setup and/or monitoring process is not completed and/or that a key performance indicator associated with a step in the measurement design, setup and/or monitoring process has passed a threshold.