Micro-channel Structure Fabrication via Sputtering and Sacrificial Rails
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Solution Overview
Problem
Conventional methods for fabricating micro-channel structures are complex, expensive, and inefficient, with difficulties in producing high-resolution or ultra-high-resolution channels.
Innovation Solution
A micro-channel structure comprising a base substrate with a rail layer and a wall layer, forming a micro-channel between the rails, where the micro-channel's direction is parallel to the substrate's surface, and a method involving sputtering to control the channel's dimensions and shape, allowing for partial or complete openness on one side.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional methods are used to fabricate micro-channel structures, then the structures can be produced, but the fabrication process becomes complex and expensive
Solution Approach 1:
The fabrication process is segmented into distinct stages: forming sacrificial rails first, then depositing wall material, and finally removing rails to create channels. This segmentation allows each step to be optimized independently and simplifies the overall process compared to conventional single-step approaches.
Solution Approach 2:
Sacrificial rails serve as intermediary structures that guide wall material deposition and define channel geometry temporarily. These rails are removed after serving their purpose, leaving behind precisely formed micro-channels. This intermediary approach enables high-resolution fabrication without complex direct patterning.
2Productivity
If conventional fabrication methods are used, then micro-channels can be formed, but production efficiency is low and costs are high
Solution Approach 1:
The sacrificial rails are formed in advance before wall material deposition. This preliminary action establishes the exact channel geometry template, allowing subsequent wall material to be deposited uniformly around predefined paths, significantly improving fabrication efficiency and reducing costs.
Solution Approach 2:
The sacrificial rails automatically define the micro-channel geometry through their placement and dimensions. The rails themselves serve as the pattern definition, eliminating the need for complex photolithography masks or direct channel patterning, thereby simplifying manufacturing and reducing costs.
3Manufacturing precision
If high-resolution micro-channels are produced using conventional methods, then channel precision is achieved, but the process becomes inefficient
Solution Approach 1:
The invention replaces complex mechanical photolithography and etching systems with a simpler deposition-removal process. Wall material is deposited conformally around sacrificial rails using standard deposition techniques, then rails are removed, achieving high resolution without the inefficiencies of multi-step mechanical fabrication.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the fabrication process, reduces costs, and enables the creation of high-resolution micro-channels with improved scalability and efficiency.
Implementation Method 1
a method involving sputtering to control the micro-channel's dimensions and shape
Data Source
AI summary
The present application provides a micro-channel structure. The micro-channel structure includes a base substrate; a rail layer on the base substrate and including a first rail and a second rail spaced apart from each other; and a wall layer on a side of the rail layer distal to the base substrate, and including a first wall and a second wall at least partially spaced apart from each other, thereby forming a micro-channel between the first wall and the second wall. The micro-channel has an extension direction along a plane substantially parallel to a main surface of the base substrate, the extension direction being substantially parallel to extension directions of the first rail and the second rail along the plane substantially parallel to the main surface of the base substrate.