Digital Exposure Device Micro-Mirror Array Positioning Correction
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Solution Overview
Problem
The existing photolithography process for manufacturing display substrates is costly due to the need for multiple masks, and digital exposure devices using micro-mirrors face inaccuracies in spot beam positioning, leading to unreliable photoresist patterns.
Innovation Solution
A method involving a digital exposure device with micro-mirrors arranged in an array, where the substrate and micro-mirrors are moved in specific directions, and micro-mirrors are selectively turned on/off to irradiate spot beams on a photosensitive layer, forming a photosensitive pattern with edge portions extending at acute angles, allowing for improved precision and reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a digital exposure device using micro-mirrors is used to eliminate masks, then manufacturing cost is reduced, but positioning accuracy of spot beams deteriorates
Solution Approach 1:
The patent implements a feedback mechanism where the actual irradiated positions of spot beams are measured and compared with theoretically calculated positions. Correction values are computed based on this comparison and applied to adjust the irradiation positions in subsequent exposures. This closed-loop feedback system compensates for positioning errors inherent in digital exposure devices using micro-mirrors, thereby maintaining manufacturing precision while eliminating the need for expensive masks.
Solution Approach 2:
The patent changes the parameters of the exposure process by introducing correction values that adjust the irradiation positions. These correction values modify the relationship between the theoretically calculated positions and actual irradiated positions, effectively compensating for systematic errors in the micro-mirror positioning system without requiring hardware modifications.
2Ease of manufacture
If micro-mirrors are selectively turned on/off to form patterns, then mask cost is eliminated, but pattern reliability deteriorates
Solution Approach 1:
The feedback mechanism measures actual irradiated positions and computes correction values to ensure that the intended pattern is accurately formed. By applying these corrections, the system compensates for positioning deviations that would otherwise lead to pattern defects, thereby maintaining high pattern reliability while using the cost-effective digital exposure approach without masks.
3Ease of operation
If theoretical calculation of irradiation positions is used, then exposure process is simplified, but actual pattern accuracy deteriorates
Solution Approach 1:
The system maintains the simplicity of theoretical calculation for determining irradiation positions while introducing a feedback loop that measures actual positions and applies correction values. This approach preserves the ease of operation in designing exposure patterns while compensating for the discrepancy between theoretical and actual positioning, thereby achieving high pattern accuracy without complicating the overall exposure process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the reliability of the photosensitive pattern and the resulting display substrate by aligning the actual exposed regions with the theoretically designed pattern, reducing manufacturing costs and improving the accuracy of the thin-film pattern formation.
Implementation Method 1
a digital exposure device using an optical element including a plurality of micro-mirrors capable of providing a plurality of spot beams onto a substrate
Implementation Method 2
a photoresist pattern is formed using a mask, which is associated with a design of a metal pattern, and an exposure device
Data Source
AI summary
A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.