Micro-nano Bubble Cleaning for Resist Removal
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Solution Overview
Problem
Conventional cleaning methods for glass and semiconductor substrates require high temperatures and complex processes to remove residual resist films and metal contaminants, with insufficient efficiency and environmental impact.
Innovation Solution
A cleaning method using micro-nano bubbles with a mean particle size of 100 nm or less, high density, and elevated temperature, combined with ultrasonic vibration and voltage application, to efficiently peel off residual resist films and remove metal contaminants using a treatment solution containing ozone or oxygen in pure water.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional cleaning methods are used with high temperature and complex processes, then contaminants can be removed, but energy consumption increases and environmental impact worsens
Solution Approach 1:
The invention changes the physical parameters of the cleaning medium by using micro-nano bubbles (1-100 μm) instead of conventional bulk liquid or gas. These micro-bubbles provide vastly increased gas-liquid interface area, enhancing mass transfer and cleaning effectiveness at lower temperatures, thus resolving the contradiction between reliable contaminant removal and energy consumption
Solution Approach 2:
The invention utilizes the phase transition characteristics of micro-nano bubbles, which can form, persist, and collapse at controlled rates. The bubbles dissolve or collapse over time, releasing concentrated gas at the interface that enhances contaminant removal. This dynamic phase behavior enables effective cleaning at lower temperatures compared to conventional high-temperature methods
2Reliability
If conventional cleaning processes are used, then contaminants can be removed, but cleaning time increases and productivity decreases
Solution Approach 1:
By changing to micro-nano bubble parameters (size 1-100 μm), the invention achieves rapid contaminant removal due to the extremely high surface area to volume ratio. This enables effective cleaning in significantly reduced time compared to conventional methods, resolving the contradiction between reliable removal and cleaning time
Solution Approach 2:
The micro-nano bubbles exhibit periodic formation, persistence, and collapse behavior. This periodic action creates repeated cycles of concentrated gas release at the liquid-solid interface, continuously attacking contaminants and accelerating the cleaning process while maintaining effectiveness
3Loss of energy
If micro-nano bubbles are used for cleaning, then energy consumption decreases, but bubble stability and persistence in liquid decreases
Solution Approach 1:
The invention carefully controls the size parameter of bubbles (1-100 μm) to achieve an optimal balance. Smaller bubbles have slower rise velocities and longer persistence times in liquid, while still maintaining high surface area for effective cleaning. This parameter optimization resolves the contradiction between energy efficiency and bubble persistence
4Productivity
If micro-nano bubbles are used for cleaning, then cleaning efficiency increases, but device complexity increases
Solution Approach 1:
The invention employs self-service mechanisms where simple components (nozzles, diffusers, or venturi structures) generate micro-nano bubbles through basic fluid dynamics principles without requiring complex external control systems. The system utilizes the inherent properties of fluid flow to create and maintain the bubble distribution, achieving high cleaning efficiency while minimizing device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves efficient and reliable removal of contaminants at lower temperatures with reduced environmental impact, shortening cleaning time and improving efficiency through the use of micro-nano bubbles and additional energy applications.
Implementation Method 1
dissolution or shrinkage accompanies bubbles
Implementation Method 2
the treatment solution contains gaseous micro-nano bubbles... containing ozone or oxygen in pure water
Implementation Method 3
combined with ultrasonic vibration and voltage application
Implementation Method 4
combined with ultrasonic vibration and voltage application
Implementation Method 5
elevated temperature... The treatment solution is heated to a temperature of 30 to 90°C
Data Source
AI summary
Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 108 or more bubbles per 1 mL.