Micro Plasma Cell Array for Uniform Substrate Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional substrate processing apparatuses using plasma face challenges in achieving uniform plasma distribution due to asymmetric plasma shapes, leading to complex structures and increased volume, which complicates the manufacturing process.
Innovation Solution
A substrate processing apparatus and method utilizing a plasma generating module with parallel first and second electrodes and micro plasma cells, controlled by distinct voltages and gas supplies, to create uniform plasma distribution and reduce apparatus volume.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional plasma generation methods (CCP or ICP) are used with adjusted process parameters, then plasma uniformity is attempted to be improved, but the plasma shape remains asymmetric leading to insufficient uniformity
Solution Approach 1:
The plasma generation system is divided into multiple independent plasma cells arranged in an array. Each plasma cell can be independently controlled through separate electrode connections, allowing localized adjustment of plasma characteristics to achieve overall uniformity across the substrate processing area.
Solution Approach 2:
Different regions of the plasma processing area are provided with different plasma generation characteristics through the array of plasma cells. Each cell can be independently controlled to provide locally optimized plasma properties, ensuring uniform plasma distribution across the entire substrate area.
2Manufacturing precision
If multi-zone temperature control devices or buffer spaces are added to compensate for asymmetric plasma, then plasma uniformity is improved, but the apparatus volume increases
Solution Approach 1:
The plasma generation system is segmented into multiple compact plasma cells arranged in an array pattern. This segmentation allows the system to achieve uniform plasma distribution through the spatial arrangement and independent control of cells, eliminating the need for additional buffer spaces or large multi-zone temperature control devices.
3Device complexity
If conventional plasma generation with single electrode configuration is used, then apparatus structure is simple, but plasma distribution is asymmetric and non-uniform
Solution Approach 1:
The invention uses asymmetric electrode configuration within each plasma cell, with first and second electrodes connected to different power sources. This controlled asymmetry in electrode connection enables independent control of plasma generation in different regions, achieving uniform plasma distribution across the substrate area.
Solution Approach 2:
The plasma generation system is divided into multiple plasma cells arranged in an array, with each cell containing electrodes connected to independent power sources. This segmentation with independent control allows precise adjustment of plasma characteristics in each cell to achieve overall uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves enhanced plasma uniformity and stability, ensuring consistent substrate processing results while minimizing apparatus size.
Implementation Method 1
a plasma generating module for generating plasma for processing the substrate
Implementation Method 2
an RF signal is applied to the coil to induce an electromagnetic field in the chamber to generate plasma
Data Source
AI summary
A substrate processing apparatus and method capable of maximizing plasma uniformity are provided. The substrate processing method comprises providing a substrate processing apparatus including a processing space for processing a substrate and a plasma generating module for generating plasma for processing the substrate, wherein the plasma generating module comprises a plurality of first electrodes disposed in parallel with each other in a first direction, a plurality of second electrodes disposed in parallel with each other in a second direction different from the first direction, and an array including a plurality of micro plasma cells connected to the plurality of first electrodes and the plurality of second electrodes, providing a process gas to the plurality of micro plasma cells, and providing a reaction gas to the processing space, wherein a first micro plasma cell of the plurality of micro plasma cells is provided with a first energy of a first magnitude, and to a second micro plasma cell is provided with a second energy of a second magnitude different from the first magnitude, so that an amount of radicals in plasma generated in the first micro plasma cell is different from an amount of radicals in plasma generated in the second micro plasma cell.