Microchip Time Temperature Monitoring via Dopant Diffusion
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Solution Overview
Problem
Existing time temperature monitoring solutions for microchips are complex and inefficient, failing to effectively track temperature exposure history which can lead to device failures outside specified temperature ranges.
Innovation Solution
A time temperature monitoring system integrated with microchips, utilizing a substrate with a dopant source and spatially distributed electrodes to detect dopant diffusion, providing localized time temperature information by analyzing resistivity changes in the active region, which is monitored periodically to determine exposure history.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If complex time temperature indicator solutions are implemented for microchips, then time temperature monitoring capability is provided, but device complexity increases and efficacy is limited
Solution Approach 1:
The patent merges the time temperature indicator functionality directly into the microchip fabrication process by integrating a dopant source, activation system, and electrode array into the chip substrate. This consolidation eliminates the need for separate external monitoring devices, thereby reducing overall system complexity while maintaining monitoring capability.
Solution Approach 2:
The microchip substrate serves multiple functions: it acts as both the functional microchip carrier and the housing for the time temperature monitoring system. The dopant source, activation system, and electrodes are all integrated within the same substrate, allowing a single component to perform both computational and monitoring roles.
2Loss of information
If traditional time temperature indicators are used, then temperature exposure history can be tracked, but the solution requires additional processing elements that impact surrounding circuitry
Solution Approach 1:
The monitoring system is localized to a specific region of the microchip substrate through the use of a dopant source and electrode array confined to a defined active region. This localized approach allows temperature history tracking without requiring system-wide modifications or interfering with other circuit elements on the chip.
Solution Approach 2:
The dopant diffusion process acts as an intermediary mechanism that indirectly records temperature exposure. Instead of using electronic sensors that directly interact with and potentially interfere with circuitry, the system uses dopant diffusion as a passive mediator that captures temperature history through physical diffusion patterns, which are then read by electrodes without affecting active circuit operation.
3Measurement precision
If time temperature monitoring is implemented, then real-time data for device diagnosis is available, but existing solutions fail to effectively track temperature exposure history
Solution Approach 1:
The system uses periodic activation of the dopant source to create distinct diffusion patterns that correspond to specific time intervals. By periodically activating the dopant and using multiple electrodes at varying distances, the system creates a temporal record of temperature exposure that can be accurately reconstructed, improving measurement precision for temperature history tracking.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively tracks time temperature history, enabling real-time data for device diagnosis, evaluating packaging processes, and establishing reliability standards without impacting surrounding circuitry or requiring additional processing elements, thus preventing potential failures due to temperature exposure.
Implementation Method 1
an activation system for activating a diffusion of the dopant source into the active region
Implementation Method 2
a set of spatially distributed electrodes embedded in the active region of the substrate, wherein the electrodes are configured to detect the diffusion in the active region
Data Source
AI summary
A time temperature monitoring system and method for use with a microchip or similar structure. A disclosed system includes: a substrate having an active region; a dopant source located proximate the active region; an activation system for activating a diffusion of the dopant source into the active region; and a set of spatially distributed electrodes embedded in the active region of the substrate, wherein the electrodes are configured to detect the diffusion in the active region at varying distances from the dopant source to provide time temperature information.