Micro LED Array Illumination Tool for Photolithography
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current photolithography techniques for creating patterns on large area substrates used in flat panel displays are inefficient and costly, requiring new methods to precisely and cost-effectively project images onto substrates for semiconductor and display device manufacturing.
Innovation Solution
The use of a compact illumination tool system incorporating a microLED array, beamsplitter, camera, and projection optics system for precise image projection onto substrates, allowing for independent control of light beams and minimizing the need for separate light sources and projection systems, thereby enhancing throughput and reducing maintenance downtime.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If traditional photolithography systems are used for pattern creation on large area substrates, then existing manufacturing processes can be maintained, but the process is inefficient and costly with separate light sources and projection systems
Solution Approach 1:
The patent combines separate light sources and projection systems into a single integrated illumination tool. The microLED array serves as both the light source and the pattern generation element, eliminating the need for separate illumination and projection systems. This merging reduces system complexity while improving throughput by enabling simultaneous illumination and pattern projection.
Solution Approach 2:
The microLED array performs multiple functions: it generates light for illumination, defines the pattern through selective microLED activation, and projects the pattern onto the substrate. This multi-functionality replaces traditional separate systems for illumination, mask preparation, and pattern projection, thereby improving productivity while managing device complexity.
2Ease of manufacture
If traditional separate light sources and projection systems are used, then existing photolithography processes can be maintained, but maintenance downtime increases and cost-effectiveness decreases
Solution Approach 1:
By merging multiple separate systems into a single integrated illumination tool with a microLED array, the patent reduces the number of components that require maintenance. The integrated design eliminates alignment issues between separate systems and reduces maintenance downtime while improving cost-effectiveness through simplified manufacturing and operation.
3Manufacturing precision
If conventional photolithography methods are used, then existing manufacturing capabilities are maintained, but precision and efficiency in pattern creation are insufficient
Solution Approach 1:
The patent segments the pattern creation process into individual microLED elements within the array. Each microLED can be independently controlled to define specific pattern features, enabling high precision pattern creation. This segmentation approach allows direct digital writing of patterns without requiring complex mask alignment systems, thereby improving precision while managing device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables precise and efficient pattern creation on substrates with high throughput and reduced maintenance needs, addressing the inefficiencies of existing photolithography methods by integrating light generation and projection into a single unit, thus improving the cost-effectiveness and precision of the photolithography process.
Implementation Method 1
a microLED array including one or more microLEDs. Each microLED produces at least one light beam
Implementation Method 2
a beamsplitter adjacent the microLED array
Data Source
AI summary
Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact illumination tools for projecting an image onto a substrate are provided. In one embodiment, an illumination tool includes a microLED array including one or more microLEDs. Each microLED produces at least one light beam. The illumination tool also includes a beamsplitter adjacent the microLED array, a camera adjacent the beamsplitter, and a projection optics system adjacent the beamsplitter.