Micro-LED Template Structure Without Sidewall Etching
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Solution Overview
Problem
The production of micro-LEDs is hindered by low production yield rates and high manufacturing costs, primarily due to issues such as small wafer size, low transfer efficiency, warpage, poor wavelength uniformity, non-radiative recombination during etching, and high costs associated with traditional pixel transfer methods and RGB tri-color LED usage.
Innovation Solution
A light-emitting device structure and template are developed, featuring a substrate with a GaN-based semiconductor layer and a mask layer containing mask openings filled with the semiconductor layer. A sacrificial layer is added on the semiconductor layer, allowing for direct formation of light-emitting units on the template, avoiding sidewall etching and improving efficiency, while the sacrificial layer facilitates peeling and template reuse.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If traditional fetch and release methods are used to transfer core particles to the drive backplane, then pixel transfer can be achieved, but the preparation time is too long to meet industrialization requirements
Solution Approach 1:
The template is divided into multiple independent regions with mask openings arranged in arrays, allowing parallel processing of multiple micro-LEDs simultaneously. This segmentation enables high-throughput fabrication where many devices are prepared in one go rather than sequentially
Solution Approach 2:
The GaN-based semiconductor layer is pre-formed and patterned with mask openings on the template before pixel transfer. This preliminary preparation of the semiconductor structure with predefined openings allows for rapid assembly of micro-LEDs without time-consuming in-situ fabrication during the transfer process
2Manufacturing precision
If etching is used to form light-emitting units, then pixel definition is achieved, but non-radiative recombination of sidewalls increases resulting in low luminous efficiency
Solution Approach 1:
Instead of etching away material to form pixels, the invention extracts and removes only the sacrificial layer material that was temporarily used to define pixel positions. The actual light-emitting semiconductor structures are preserved without damaging etching, eliminating sidewall damage and non-radiative recombination
Solution Approach 2:
A sacrificial layer is introduced as an intermediary material to define pixel positions during fabrication. This sacrificial layer can be cleanly removed without affecting the surrounding light-emitting structures, avoiding the harmful effects of direct etching on the semiconductor sidewalls
3Volume of moving object
If small wafer size is used for epitaxy, then micro-LED miniaturization is achieved, but transfer efficiency decreases and warpage increases affecting subsequent chip processing
Solution Approach 1:
The invention transitions from transferring individual small micro-LEDs to transferring an entire array of micro-LEDs mounted on a template. This dimensional shift from 1D/2D individual device handling to 2D/3D array transfer dramatically improves efficiency while maintaining small device dimensions
Solution Approach 2:
Multiple micro-LEDs are merged into a collective array structure on the template, allowing them to be handled and transferred as a unified group. This combining of multiple small devices into an array enables efficient bulk transfer operations
4Illumination intensity
If RGB tri-color LED is used for full color display, then color performance is achieved, but manufacturing cost increases
Solution Approach 1:
The template enables different regions to be configured with different semiconductor layer compositions optimized for specific colors (red, green, blue). Each local region on the template can be independently optimized for its intended color output, allowing cost-effective production of colored micro-LEDs tailored to specific display requirements
Data Source
AI summary
Disclosed are a light-emitting device, a template of the light-emitting device and preparation methods thereof. The template of the light-emitting device comprises a substrate; a GaN-based semiconductor layer and a mask layer provided on the substrate, where the mask layer comprises a plurality of mask openings provided at intervals, and the plurality of mask openings are filled with the GaN-based semiconductor layer; and a sacrificial layer provided on a surface of the GaN-based semiconductor layer away from the substrate and located in the plurality of mask openings provided at intervals.


