Microlens Array Beam Shaping for Atomic Clock Uniformity

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Solution Overview

Problem

Existing methods for producing uniform beams for atomic clock applications result in significant power loss due to the use of apertures, reducing power efficiency and the ability to trap a large number of atoms effectively.

Innovation Solution

An optical device comprising a substrate layer and a waveguide layer with a microlens array having a different refractive index, which transforms a diverging Gaussian beam into a beam with a substantially uniform intensity profile, eliminating the need for apertures and enhancing power efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stability of the object's composition

If an aperture is used to sample the centermost portion of a diverging Gaussian beam to produce a uniform beam, then the beam uniformity is improved, but significant power loss occurs reducing power efficiency

Engineering Contradiction:
Improvebeam uniformityVSAvoidpower loss
Core Design Contradiction:
Stability of the object's compositionVSLoss of energy

Solution Approach 1:

The patent transforms the Gaussian beam profile into a uniform profile by introducing a microlens array that modifies the optical parameters of the beam. The microlenses reshape the wavefront and intensity distribution, converting the characteristic Gaussian intensity profile into a uniform distribution across the beam cross-section, thereby achieving beam uniformity without aperture-based power loss

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The microlens array serves as an intermediary optical element between the diverging Gaussian beam source and the desired uniform beam output. Each microlens in the array acts as a local transformer that redirects and redistributes light rays, mediating the transition from non-uniform to uniform intensity profile while preserving optical power

Inventive Principle:
Principle #24Intermediary (Mediator)

2Stability of the object's composition

If an aperture is used to produce a uniform beam, then the beam profile uniformity is improved, but the power efficiency deteriorates

Engineering Contradiction:
Improveintensity profile uniformityVSAvoidpower efficiency
Core Design Contradiction:
Stability of the object's compositionVSUse of energy by moving object

Solution Approach 1:

The microlens array changes the spatial distribution parameters of the beam intensity by refracting light at controlled angles. Each lens element modifies the local intensity parameters, transforming the overall beam profile from Gaussian to uniform while maintaining total optical power, thus improving power efficiency

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent replaces the mechanical aperture-based beam shaping method with an optical microlens array system. Instead of physically blocking portions of the beam with an aperture, the microlens array optically transforms the beam profile through refraction, eliminating the need for mechanical power loss

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Stability of the object's composition

If an aperture is used to sample the center portion of the beam, then the uniformity is improved, but the number of trapped atoms is reduced

Engineering Contradiction:
Improvebeam uniformityVSAvoidnumber of trapped atoms
Core Design Contradiction:
Stability of the object's compositionVSQuantity of substance

Solution Approach 1:

By transforming the intensity profile parameters from Gaussian to uniform distribution, the microlens array ensures that the optical density is evenly distributed across the entire beam cross-section. This uniform distribution provides consistent trapping potential across a larger spatial volume, enabling capture of more atoms compared to the centered aperture approach

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The microlens array approach utilizes the full two-dimensional cross-section of the diverging beam for atom trapping, whereas the aperture method effectively reduces the usable dimension to only the central portion. By engaging the entire beam area with uniform intensity, the system increases the effective trapping volume and atom capture capacity

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution achieves a more uniform intensity profile for the beam, improving the stability and efficiency of atomic clock operations by maintaining power and enhancing the ability to trap atoms effectively.

Implementation Method 1

a microlens array having a different refractive index, which transforms a diverging Gaussian beam into a beam with a substantially uniform intensity profile

Methodology Applied
Scientific EffectRefraction: Refraction

Data Source

PatentEP4411214A1Microlens devices to control far-field emission of a diverging planar beam
Publication Date: 2024.08.07 HONEYWELL INTERNATIONAL INC
  • EP4411214A1 patent drawingFigure 1
  • EP4411214A1 patent drawingFigure 2
  • EP4411214A1 patent drawingFigure 3

AI summary

An optical device comprises a substrate layer having an upper surface, and a waveguide layer over the upper surface of the substrate layer. The waveguide layer comprises an input waveguide defined by a first waveguide portion having a first refractive index; an input slab defined by the first waveguide portion, the input slab adjoined with the input waveguide; and a microlens array defined by a second waveguide portion having a second refractive index that is different from the first refractive index. The microlens array is in optical communication with the input waveguide through the input slab. The microlens array is configured to receive a diverging planar light beam from the input slab along a direction of propagation. The microlens array is configured to control a far-field emission of the light beam such that an emission profile of the light beam exhibits a substantially uniform intensity.