Micro-lens Array Homogenizer for Wafer Inspection Illumination

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Solution Overview

Problem

Existing wafer inspection technologies face challenges in achieving high-intensity, homogeneous illumination, which is crucial for accurate defect detection as inhomogeneous illumination can falsely indicate defects during image comparison.

Innovation Solution

The apparatus employs a combination of collector optics, homogenizing optics with two micro-lens arrays, and Fourier optics to project a light source onto a specular surface, ensuring uniform and high-intensity illumination by overlapping near-field light distributions, and an objective optics to project the surface onto a detector for image recording.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If conventional illumination systems are used, then the structure is simple, but the illumination intensity is insufficient and homogeneity is poor

Engineering Contradiction:
Improveillumination intensityVSAvoidoptical system complexity
Core Design Contradiction:
Illumination intensityVSDevice complexity

Solution Approach 1:

The illumination system is segmented into multiple functional modules: collector optics for light gathering, homogenizing optics with micro-lens arrays for uniformity, and Fourier optics for intensity distribution control. This segmentation allows each module to optimize specific parameters without compromising overall system performance.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The optical components are arranged in a nested configuration where the micro-lens arrays are positioned within the focal regions of previous optical elements. The first micro-lens array is nested within the collector optics focal region, and the second micro-lens array is nested within the first array's focal region, creating a compact nested structure that maximizes space utilization and optical efficiency.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Illumination intensity

If conventional illumination systems are used, then the device complexity is low, but the illumination homogeneity is insufficient

Engineering Contradiction:
Improveillumination homogeneityVSAvoidoptical system complexity
Core Design Contradiction:
Illumination intensityVSDevice complexity

Solution Approach 1:

The micro-lens arrays provide local quality enhancement by independently controlling light distribution in different spatial regions. Each micro-lens acts as a local light redistribution element, ensuring uniform illumination across the entire wafer surface while maintaining the ability to address local variations in light intensity.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The system changes optical parameters through the use of micro-lens arrays with specific focal lengths and spacing configurations. By adjusting the focal lengths of the micro-lenses and their relative positions, the illumination homogeneity and intensity distribution can be precisely controlled to match the requirements of different inspection applications.

Inventive Principle:
Principle #35Parameter changes

3Productivity

If high-intensity illumination is used, then throughput increases, but false defect indications occur due to inhomogeneity

Engineering Contradiction:
Improvewafer throughputVSAvoiddefect detection accuracy
Core Design Contradiction:
ProductivityVSMeasurement precision

Solution Approach 1:

The homogenizing optics with micro-lens arrays serve as an intermediary between the light source and the wafer surface. This intermediary component transforms the non-uniform high-intensity light from the collector optics into a homogeneous illumination pattern, enabling both high throughput and accurate defect detection without false indications.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration achieves an extremely uniform and high-intensity illumination on the wafer, enhancing inspection throughput and accuracy by minimizing false defect indications.

Implementation Method 1

the near-field distribution of the light source is homogenized by overlapping the images

Methodology Applied
Scientific EffectLight projection and overlapping: Light

Implementation Method 2

the collector optics and the first micro-lens array project the light source onto the second micro-lens array

Methodology Applied
Scientific EffectLens focusing: Lens

Implementation Method 3

a Fourier optics for transmitting the light from the homogenizing optics onto the specular surface

Methodology Applied
Scientific EffectOptical transmission and focusing: Lens

Data Source

PatentUS7561263B2Apparatus for illuminating and inspecting a surface
Publication Date: 2009.07.14 VISTEC SEMICON SYST
  • US7561263B2 patent drawing
  • US7561263B2 patent drawing
  • US7561263B2 patent drawing

AI summary

The present invention relates to an apparatus for illuminating and inspecting a specular surface, comprising a light source, a collector optics for collecting the light from the light source, a homogenizing optics for transmitting the light from the collector optics having a first micro-lens array downstream of the collector optics, and a second micro-lens array downstream of the first micro-lens array, a Fourier optics for transmitting the light from the homogenizing optics onto the specular surface, an objective optics, and a detector for receiving an image, wherein the collector optics and the first micro-lens array project the light source onto the second micro-lens array and wherein the second micro-lens array and the Fourier optics project the first micro-lens array onto the specular surface, and wherein the objective optics projects the specular surface onto the detector.