Microlithography Projection Lens Array Image Error Compensation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing optical systems, such as projection lens arrays in microlithography, face challenges in compensating for aberrations caused by intensity distributions, which lead to image errors and require frequent system interruptions for measurement and correction.
Innovation Solution
A method that determines location- and time-dependent intensity distributions in optical elements, calculates absorbed energy and resulting deformations, and selects compensation measures such as moving or rotating optical elements, or adjusting temperature, to correct image errors without interrupting the system's operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If measurement and correction procedures are implemented in existing optical systems, then image errors caused by intensity distributions can be compensated, but the system's operating time is frequently restricted due to required interruptions
Solution Approach 1:
The patent applies preliminary action by pre-determining the intensity distribution in the optical element and calculating the resulting image errors before actual operation. This allows the system to pre-calculate compensation measures and apply them proactively, eliminating the need for frequent interruptions during operation for measurement and correction.
Solution Approach 2:
The patent replaces physical measurement interventions with computational simulation. Instead of mechanically interrupting the system to perform measurements and corrections, the invention uses mathematical models to simulate intensity distributions and calculate compensation measures, enabling continuous operation without mechanical or physical interruptions.
2Manufacturing precision
If compensation measures are applied to correct image errors, then image quality is improved, but the complexity of the optical system increases
Solution Approach 1:
The patent uses computational copying by creating a mathematical model that replicates the optical system's behavior regarding intensity distribution and image errors. This virtual copy allows for simulation and calculation of compensation measures without adding physical complexity to the actual optical system, maintaining simplicity while achieving correction.
Solution Approach 2:
The patent applies parameter changes by adjusting operational parameters of the optical system based on calculated compensation measures. Instead of adding complex hardware components, the invention modifies existing parameters such as illumination intensity distribution or optical element positioning to achieve image error compensation, thereby improving image quality without significantly increasing system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for effective compensation of image errors while minimizing the restriction on the optical system's operating time, enabling continuous operation and reducing the need for frequent interruptions.
Implementation Method 1
determining at least one location-dependent and time-dependent absorbed energy in the optical element
Implementation Method 2
determining at least one deformation and change of optical properties of the optical element caused by the absorbed energy
Implementation Method 3
determining at least one deformation and change of optical properties of the optical element caused by the absorbed energy
Data Source
AI summary
The disclosure relates to a method for compensating image errors, generated by intensity distributions in optical systems, such as in projection lens arrays of microlithography systems, and to respective optical systems, such as projection lens arrays of microlithography systems.