Microlithography Optical System with Adjustable Mirror and Manipulator
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Solution Overview
Problem
Microlithographic projection exposure apparatuses face limitations in setting flexible intensity and polarization distributions in the pupil plane, which affects imaging contrast and precision in microstructured component production.
Innovation Solution
An optical system comprising a mirror arrangement with independently adjustable mirror elements and a manipulator with a raster arrangement of elements that alter the light's polarization state and intensity, allowing for precise control of illumination settings by varying the angular distribution of light and positioning manipulator elements to achieve desired polarization and intensity distributions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a mirror arrangement with independently adjustable mirror elements is used to alter angular distribution of light, then flexibility in setting illumination settings is improved, but device complexity increases
Solution Approach 1:
The mirror arrangement is divided into multiple independently adjustable mirror elements, each capable of being positioned separately to control different regions of the pupil plane. This segmentation allows flexible configuration of illumination settings by adjusting individual mirror elements while maintaining a manageable overall system structure.
Solution Approach 2:
The mirror elements are made dynamically adjustable during operation, allowing the angular distribution of light to be altered in real-time. This dynamic capability enables rapid switching between different illumination settings without mechanical reconfiguration of the entire system, balancing flexibility with operational simplicity.
2Manufacturing precision
If a manipulator with raster arrangement of elements is added to control polarization state and intensity, then imaging contrast is improved, but device complexity increases
Solution Approach 1:
The manipulator with raster arrangement of manipulator elements is integrated into the existing illumination system downstream of the mirror arrangement. This merging approach allows simultaneous control of polarization state and intensity across different regions of the pupil plane without requiring separate independent systems, thereby improving imaging contrast while limiting the increase in overall device complexity.
3Adaptability or versatility
If multiple mirror elements are adjusted to alter angular distribution of light, then flexibility in illumination settings is improved, but ease of operation deteriorates
Solution Approach 1:
The system incorporates feedback mechanisms that automatically coordinate the adjustment of multiple mirror elements when changing illumination settings. This feedback control simplifies operation by eliminating the need for manual adjustment of each individual mirror element, allowing operators to select desired illumination settings through simplified controls while the system automatically manages the complex coordination of multiple mirror elements.
4Adaptability or versatility
If manipulator elements are positioned to influence light differently at different incidence locations, then polarization distribution control is improved, but device complexity increases
Solution Approach 1:
The manipulator elements are arranged in a raster pattern with locally optimized properties, where each element can independently influence the polarization state of light incident at its specific location. This local quality approach allows precise control of polarization distribution across different regions of the pupil plane while maintaining a regular, manageable overall structure that limits system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances flexibility in setting illumination settings, enables rapid switching between different illumination modes without changing polarization or intensity elements, and optimizes imaging contrast by compensating for unwanted polarization effects, thereby improving the process window and imaging quality.
Implementation Method 1
at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement
Implementation Method 2
at least one manipulator which is arranged downstream of the mirror arrangement in the light propagation direction and has a raster arrangement of manipulator elements so that light incident on the manipulator in operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location
Data Source
AI summary
An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.