Microlithography Optical System Polarization Control
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Solution Overview
Problem
Existing microlithographic projection exposure apparatuses face challenges in flexibly setting different polarized illumination settings with minimal structural changes, particularly in retrofitting or extending existing systems, due to limitations in adjusting polarization distributions and dealing with undesirable polarization rotations caused by deflection devices.
Innovation Solution
An optical system comprising a mirror arrangement with independently adjustable mirror elements, a polarization-influencing optical arrangement with variable overlap, and a deflection device with reflection surfaces upstream and downstream, allowing for flexible polarization settings by accounting for polarization rotations using optically active or birefringent components, enabling 'plug-and-play' replacement of diffractive optical elements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a polarization-influencing optical arrangement with multiple displaceable components is used in combination with a mirror arrangement, then different polarization distributions can be realized flexibly, but the device complexity increases
Solution Approach 1:
A deflection device with reflection surfaces is introduced as an intermediary component between the light source and the polarization-influencing optical arrangement. This deflection device redirects the light beam to pass through the polarization-influencing components in a specific sequence, enabling flexible polarization control without requiring direct integration of all components in the optical path. The deflection device acts as a mediator that organizes the interaction between light and polarization components, achieving versatile polarization settings while managing system complexity.
2Adaptability or versatility
If diffractive optical elements are replaced with mirror arrangements and polarization-influencing components, then polarization settings can be optimized, but the structural modifications required are significant
Solution Approach 1:
The optical system is divided into distinct functional modules: the existing mirror arrangement for angular distribution control, a separate polarization-influencing optical arrangement with displaceable components, and a deflection device with reflection surfaces. This segmentation allows the polarization control functionality to be added as a modular extension to existing systems rather than requiring complete redesign. Each module can be independently optimized and adjusted, facilitating easier manufacturing and retrofitting while maintaining versatile polarization settings.
3Adaptability or versatility
If the polarization-influencing component is displaced to adjust the degree of overlap with the mirror arrangement, then different polarization distributions are achieved, but the alignment precision requirements increase
Solution Approach 1:
The system incorporates feedback mechanisms to monitor and adjust the alignment between the polarization-influencing components and the mirror arrangement. By measuring the actual polarization distribution achieved and comparing it with the desired distribution, the system can automatically adjust the displacement of polarization-influencing components to maintain optimal alignment. This feedback control reduces the manual alignment precision requirements while achieving accurate polarization distributions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables flexible and efficient setting of different polarization states with minimal structural modifications, optimizing illumination settings and reducing imaging aberrations and contrast loss by accounting for polarization rotations, thus enhancing the performance of microlithographic projection exposure apparatuses.
Implementation Method 1
accounting for polarization rotations caused by deflection devices
Implementation Method 2
deflection device having a respective reflection surface upstream and downstream of the mirror arrangement
Implementation Method 3
accounting for polarization rotations using optically active or birefringent components
Implementation Method 4
accounting for polarization rotations using optically active or birefringent components
Implementation Method 5
mirror arrangement having a plurality of mirror elements which are adjustable independently of one another for the purpose of changing an angular distribution of the light reflected by the mirror arrangement
Data Source
AI summary
The invention relates to an optical system of a microlithographic projection exposure apparatus, comprising a mirror arrangement having a plurality of mirror elements which are adjustable independently of one another for the purpose of changing an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement having at least one polarization-influencing component, wherein, by displacing the polarization-influencing component, a degree of overlap between the polarization-influencing component and the mirror arrangement can be set in a variable manner, and a deflection device having a respective reflection surface upstream and downstream of the mirror arrangement relative to the light propagation direction.